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Sugi Predict / Compounds / SCHEMBL21392301

SCHEMBL21392301

SCHEMBL21392301

O=C1C2CC3CC1CC(C(=O)OCC1COC4(OC1COC(=O)C15CC6CC(C1)C(=O)C(C6)C5)C1CC5CC4CC(OC(=O)C(F)(F)S(=O)(=O)O)(C5)C1)(C3)C2

nearest known ligand 0.32

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
▸ TSHR P16473 1/20 0.32
▸ NPSR1 Q6W5P4 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26402956 0.91 TSHR (0.33) TSHRNPSR1
SCHEMBL19604892 0.91 TSHR (0.36) TSHRNPSR1
SCHEMBL17550598 0.89 — —
SCHEMBL17550523 0.89 TSHR (0.34) TSHRNPSR1
SCHEMBL24064301 0.85 TSHR (0.34) TSHRNPSR1
SCHEMBL16946282 0.85 — —
SCHEMBL21392291 0.85 TSHR (0.32) TSHRNPSR1
SCHEMBL16946283 0.84 — —
SCHEMBL19604975 0.83 ALDH1A1 (0.32) TSHRNPSR1
SCHEMBL26402942 0.83 MEN1 (0.30) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11198748-B2 Resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-12-14 — — US disclosed
US-20200233300-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2020-07-23 — — US disclosed
US-20190292287-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2019-09-26 — — US disclosed