Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 1/20 | 0.53 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.53 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.52 |
| ▸ | LMNA | P02545 | 1/20 | 0.52 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.49 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28349855 | 0.89 | ALDH1A1 (0.57) | MAPTMAPK1KMT2AALDH1A1LMNA | |
| SCHEMBL27975925 | 0.89 | MAPT (0.60) | MAPTMAPK1KMT2AALDH1A1LMNA | |
| SCHEMBL27548463 | 0.89 | MAPT (0.60) | MAPTMAPK1KMT2AALDH1A1LMNA | |
| SCHEMBL7538065 | 0.88 | MAPT (0.53) | MAPTMAPK1KMT2AALDH1A1LMNA | |
| SCHEMBL20505978 | 0.88 | MAPT (0.53) | MAPTMAPK1KMT2AALDH1A1LMNA | |
| SCHEMBL23865155 | 0.88 | MAPT (0.53) | MAPTMAPK1KMT2AALDH1A1LMNA | |
| SCHEMBL7173571 | 0.88 | MAPT (0.53) | MAPTMAPK1KMT2AALDH1A1LMNA | |
| SCHEMBL20192085 | 0.88 | MAPT (0.53) | MAPTMAPK1KMT2AALDH1A1LMNA | |
| SCHEMBL29199857 | 0.88 | MAPT (0.53) | MAPTMAPK1KMT2AALDH1A1LMNA | |
| SCHEMBL16188009 | 0.88 | MAPT (0.53) | MAPTMAPK1KMT2AALDH1A1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20200407477-A1 | POLYMER, POSITIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | ZEON CORPORATION (JP) | 2020-12-31 | — | — | US | disclosed |
| WO-2019181582-A1 | POLYMER, POSITIVE RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | 日本ゼオン株式会社 | 2019-09-26 | — | — | WO | disclosed |