Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ATM | Q13315 | 1/20 | 0.51 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.43 |
| ▸ | GRM1 | Q13255 | 6/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | PDE4A | P27815 | 3/20 | 0.32 |
| ▸ | PDE4B | Q07343 | 3/20 | 0.32 |
| ▸ | PDE4C | Q08493 | 3/20 | 0.32 |
| ▸ | PDE4D | Q08499 | 3/20 | 0.32 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.32 |
| ▸ | SCN9A | Q15858 | 2/20 | 0.32 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16188010 | 0.84 | ATM (0.50) | ATMCYP19A1GRM1POLBPDE4A | |
| SCHEMBL16168301 | 0.84 | ATM (0.50) | ATMCYP19A1GRM1POLBPDE4A | |
| SCHEMBL75299 | 0.84 | ATM (0.50) | ATMCYP19A1GRM1POLBPDE4A | |
| SCHEMBL5668247 | 0.84 | ATM (0.50) | ATMCYP19A1GRM1POLBPDE4A | |
| SCHEMBL32689203 | 0.81 | ATM (0.59) | ATMCYP19A1GRM1POLBPDE4A | |
| SCHEMBL10204699 | 0.81 | ATM (0.47) | ATMCYP19A1GRM1POLBPDE4A | |
| SCHEMBL8636425 | 0.80 | ATM (0.58) | ATMCYP19A1GRM1POLBPDE4A | |
| SCHEMBL8636554 | 0.80 | ATM (0.58) | ATMCYP19A1GRM1POLBPDE4A | |
| SCHEMBL2655194 | 0.80 | ATM (0.58) | ATMCYP19A1GRM1POLBPDE4A | |
| Methacrylic Acid SCHEMBL4802534 | 0.80 | ATM (0.50) | ATMCYP19A1GRM1PDE4APDE4B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20200407477-A1 | POLYMER, POSITIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | ZEON CORPORATION (JP) | 2020-12-31 | — | — | US | disclosed |
| WO-2019181582-A1 | POLYMER, POSITIVE RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | 日本ゼオン株式会社 | 2019-09-26 | — | — | WO | disclosed |