SCHEMBL21396854

SCHEMBL21396854

N#CC(CCC12CC3CC(CC(C3)C1)C2)S(=O)(=O)O

nearest known ligand 0.39

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 6/20 0.39
GRIN2D O15399 4/20 0.37
GRIN3B O60391 4/20 0.37
GRIN1 Q05586 4/20 0.37
GRIN2A Q12879 4/20 0.37
GRIN2B Q13224 4/20 0.37
GRIN2C Q14957 4/20 0.37
GRIN3A Q8TCU5 4/20 0.37
MEN1 O00255 3/20 0.34
KMT2A Q03164 3/20 0.34
ALDH1A1 P00352 3/20 0.33
MAPT P10636 1/20 0.33
CA12 O43570 1/20 0.33
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
CA9 Q16790 1/20 0.33
TSHR P16473 1/20 0.33
DPP4 P27487 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21398838 0.78
SCHEMBL27686906 0.75 GRIN2D (0.47) EPHX2GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL21396819 0.74 EPHX2 (0.42) EPHX2GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL22551558 0.74 GRIN2D (0.45) EPHX2GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL23206979 0.71 EPHX2 (0.40) EPHX2GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL21398769 0.70 EPHX2 (0.39) EPHX2GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL22131563 0.70 EPHX2 (0.42) EPHX2GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL1010509 0.69 EPHX2 (0.47) EPHX2GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL23781721 0.68 GRIN2D (0.48) EPHX2GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL28136761 0.68 GRIN2D (0.50) EPHX2GRIN2DGRIN3BGRIN1GRIN2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20190294042-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2019-09-26 US disclosed