⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21396854 | 0.78 | EPHX2 (0.39) | — | |
| SCHEMBL18427164 | 0.73 | GAA (0.31) | — | |
| SCHEMBL21396625 | 0.73 | DPP4 (0.30) | — | |
| SCHEMBL23921327 | 0.71 | — | — | |
| SCHEMBL15706056 | 0.70 | GABRR1 (0.35) | — | |
| SCHEMBL19057965 | 0.67 | — | — | |
| SCHEMBL21398469 | 0.66 | ALDH1A1 (0.30) | — | |
| SCHEMBL12248055 | 0.66 | EPHX2 (0.31) | — | |
| SCHEMBL24413974 | 0.64 | — | — | |
| SCHEMBL21396547 | 0.64 | GAA (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11073762-B2 | Actinic ray-sensitive or radiation sensitive resin composition, actinic raysensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and photoacid generator | FUJIFILM CORPORATION (JP) | 2021-07-27 | — | — | US | disclosed |
| US-20190294043-A1 | ACTINIC RAY-SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTINIC RAYSENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND PHOTOACID GENERATOR | FUJIFILM CORPORATION (JP) | 2019-09-26 | — | — | US | disclosed |