Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 8/20 | 0.51 |
| ▸ | KMT2A | Q03164 | 8/20 | 0.51 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.49 |
| ▸ | MAPT | P10636 | 2/20 | 0.49 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.49 |
| ▸ | ATM | Q13315 | 1/20 | 0.49 |
| ▸ | CA12 | O43570 | 1/20 | 0.45 |
| ▸ | CA1 | P00915 | 1/20 | 0.45 |
| ▸ | CA2 | P00918 | 1/20 | 0.45 |
| ▸ | CA9 | Q16790 | 1/20 | 0.45 |
| ▸ | SCN9A | Q15858 | 3/20 | 0.39 |
| ▸ | EPHX2 | P34913 | 3/20 | 0.39 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17740622 | 0.83 | MEN1 (0.58) | MEN1KMT2AALDH1A1MAPTL3MBTL1 | |
| SCHEMBL27437514 | 0.83 | MEN1 (0.58) | MEN1KMT2AALDH1A1MAPTL3MBTL1 | |
| SCHEMBL686566 | 0.82 | MEN1 (0.48) | MEN1KMT2AALDH1A1MAPTL3MBTL1 | |
| SCHEMBL685799 | 0.80 | MEN1 (0.55) | MEN1KMT2AALDH1A1MAPTL3MBTL1 | |
| SCHEMBL16744373 | 0.79 | MEN1 (0.57) | MEN1KMT2AALDH1A1MAPTL3MBTL1 | |
| SCHEMBL21398831 | 0.78 | ALDH1A1 (0.46) | MEN1KMT2AALDH1A1MAPTL3MBTL1 | |
| SCHEMBL19325399 | 0.76 | MEN1 (0.54) | MEN1KMT2AALDH1A1MAPTL3MBTL1 | |
| SCHEMBL15014459 | 0.76 | MEN1 (0.48) | MEN1KMT2AALDH1A1MAPTL3MBTL1 | |
| SCHEMBL18467690 | 0.75 | MEN1 (0.50) | MEN1KMT2AALDH1A1MAPTL3MBTL1 | |
| SCHEMBL21396994 | 0.75 | MEN1 (0.53) | MEN1KMT2AALDH1A1MAPTL3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20190294042-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2019-09-26 | — | — | US | disclosed |