SCHEMBL21398842

SCHEMBL21398842

O=C(C(C1CCCCC1)C1CCCCC1)C(OC1CCCC1)S(=O)(=O)O

nearest known ligand 0.41

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 3/20 0.41
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
RAD52 P43351 1/20 0.33
DPP4 P27487 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21396662 0.77 EPHX1 (0.40) EPHX1CA1CA2
SCHEMBL23143074 0.74 EPHX1 (0.38) EPHX1CA1CA2
SCHEMBL21397019 0.72 EPHX1 (0.34) EPHX1
SCHEMBL21396554 0.72 CYP19A1 (0.38) EPHX1CA1CA2RAD52
SCHEMBL11197502 0.72 EPHX1 (0.64) EPHX1CA1CA2DPP4
SCHEMBL21396665 0.70 CA12 (0.33) EPHX1
SCHEMBL23143048 0.68 EPHX1 (0.40) EPHX1CA1CA2
SCHEMBL23143018 0.67 EPHX1 (0.42) EPHX1CA1CA2
SCHEMBL23930274 0.66 EPHX1 (0.50) EPHX1CA1CA2
SCHEMBL873008 0.66 EPHX1 (0.50) EPHX1CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12032290-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2024-07-09 US disclosed
US-20210318616-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2021-10-14 US disclosed
US-11073762-B2 Actinic ray-sensitive or radiation sensitive resin composition, actinic raysensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and photoacid generator FUJIFILM CORPORATION (JP) 2021-07-27 US disclosed
US-20190294043-A1 ACTINIC RAY-SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTINIC RAYSENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND PHOTOACID GENERATOR FUJIFILM CORPORATION (JP) 2019-09-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11073762-B2 Actinic ray-sensitive or radiation sensitive resin composition, actinic raysensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and photoacid generator PRKAR2A, PRKAR2B, RER1 EPHX1 190/4885CA1 2695/4885CA2 4033/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.