Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16751114 | 1.00 | PTGS1 (0.31) | PTGS1PTGS2 | |
| SCHEMBL17766122 | 0.87 | PTGS1 (0.30) | PTGS1PTGS2 | |
| SCHEMBL5703992 | 0.85 | PTGS1 (0.37) | PTGS1PTGS2 | |
| SCHEMBL17766170 | 0.85 | — | — | |
| SCHEMBL17766121 | 0.84 | — | — | |
| SCHEMBL17766162 | 0.84 | — | — | |
| SCHEMBL17766173 | 0.81 | — | — | |
| SCHEMBL21219899 | 0.81 | PTGS1 (0.33) | PTGS1PTGS2 | |
| SCHEMBL10771045 | 0.81 | PTGS1 (0.33) | PTGS1PTGS2 | |
| SCHEMBL2140213 | 0.79 | PTGS1 (0.32) | PTGS1PTGS2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 145 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116693882-A | Deodorizing method for polyethylene wax | 青岛赛诺新材料有限公司 | 2023-09-05 | — | — | CN | claimed |
| CN-110691835-B | Salt water resistant silica sol | 日产化学美国公司 | 2022-12-09 | — | — | CN | claimed |
| US-20210365552-A1 | CORE SHELL LIQUID METAL ENCAPSULATES COMPRISING MULTI-FUNCTIONAL LIGANDS AND NETWORKS COMPRISING SAME | GOVERNMENT OF THE UNITED STATES, AS REPRESENTED BY THE SECRETARY OF THE AIR FORCE | 2021-11-25 | — | — | US | claimed |
| US-10689538-B2 | Multicomponent reactive inks and printing method | SICPA HOLDING SA (CH) | 2020-06-23 | — | — | US | claimed |
| US-20200143955-A1 | CORE SHELL LIQUID METAL ENCAPSULATES COMPRISING MULTI-FUNCTIONAL LIGANDS AND NETWORKS COMPRISING SAME | GOVERNMENT OF THE UNITED STATES, AS REPRESENTED BY THE SECRETARY OF THE AIR FORCE | 2020-05-07 | — | — | US | claimed |
| EP-3458538-A1 | ADHESIVES FOR ASSEMBLING COMPONENTS OF INERT MATERIAL | Sicpa Holding SA (CH) | 2019-03-27 | — | — | EP | claimed |
| WO-2017198820-A1 | ADHESIVES FOR ASSEMBLING COMPONENTS OF INERT MATERIAL | SICPA HOLDING SA (CH) | 2017-11-23 | — | — | WO | claimed |
| US-9534087-B2 | Method for manufacturing polysilsesquioxane by using carbon dioxide solvent and polysilsesquioxane manufactured using the same | KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY (KR) | 2017-01-03 | — | — | US | claimed |
| US-4725635-A | MIXTURE OF POLYSILOXANES, EPOXY-CONTAINING ALKOXY SILANE AND SILICON FREE EPOXY COMPOUND; DISCOLORATION INHIBITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1988-02-16 | — | — | US | claimed |
| US-20250230298-A1 | COMPOSITION, FLUORORESIN SHEET, AND METHOD FOR PRODUCING SAME | DAIKIN INDUSTRIES, LTD. (JP) | 2025-07-17 | — | — | US | disclosed |
| CN-120077451-A | Dielectric and method for manufacturing the same | 大金工业株式会社 | 2025-05-30 | — | — | CN | disclosed |
| CN-120051529-A | Composition, fluororesin sheet, and method for producing same | 大金工业株式会社 | 2025-05-27 | — | — | CN | disclosed |
| US-11914295-B2 | Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20230333472-A1 | THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-19 | — | — | US | disclosed |
| EP-0318469-B1 | PACKING FOR USE IN RESOLUTION | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 1992-06-10 | — | — | EP | disclosed |
| US-4640967-A | Ultraviolet radiation-curable silicone release compositions with epoxy and/or acrylic functionality | GENERAL ELECTRIC COMPANY (US) | 1987-02-03 | — | — | US | disclosed |
| US-4619984-A | MODIFIED SILICA GEL | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 1986-10-28 | — | — | US | disclosed |
| US-4576999-A | Ultraviolet radiation-curable silicone release compositions with epoxy and/or acrylic functionality | GENERAL ELECTRIC COMPANY (US) | 1986-03-18 | — | — | US | disclosed |
| EP-0150221-A1 | PACKING FOR USE IN SEPARATION | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 1985-08-07 | — | — | EP | disclosed |
| US-3969308-A | SILICONE, FILLER | RAYCHEM LIMITED (EN) | 1976-07-13 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230333472-A1 | THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS | RPS4X, SIK3, MLX | PTGS1 4457/4885PTGS2 4055/4885 |
| US-11914295-B2 | Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process | RPS4X, SIK3, MLX | PTGS1 4457/4885PTGS2 4055/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.