SCHEMBL2142252

SCHEMBL2142252

CCC(C)(C)O[SiH](OC(C)(C)CC)OC(C)(C)CC

nearest known ligand 0.47

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.47
TDP1 Q9NUW8 2/20 0.47
ALDH1A1 P00352 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Propane SCHEMBL8915713 0.83 ALDH1A1 (0.46) TSHRTDP1ALDH1A1
SCHEMBL15135117 0.78 TSHR (0.45) TSHRTDP1ALDH1A1
SCHEMBL15309834 0.78
Isopropyl Alcohol SCHEMBL8918581 0.75 ALDH1A1 (0.39) TSHRTDP1ALDH1A1
SCHEMBL15135088 0.75 TSHR (0.43) TSHRTDP1ALDH1A1
SCHEMBL31148344 0.75 TSHR (0.43) TSHRTDP1ALDH1A1
SCHEMBL10350557 0.73 TSHR (0.35) TSHRTDP1ALDH1A1
SCHEMBL15135084 0.71 ALDH1A1 (0.39) TSHRTDP1ALDH1A1
SCHEMBL15135199 0.71 ALDH1A1 (0.39) TSHRTDP1ALDH1A1
SCHEMBL18926620 0.69 ALDH1A1 (0.38) TSHRTDP1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0189197-B1 PROCESS FOR PREPARING VINYL-TRI-(TERTIARY-SUBSTITUTED)ALKOXYSILANES UNION CARBIDE CORPORATION (US) 1990-05-30 EP claimed
EP-0189197-A2 Process for preparing vinyl-tri-(tertiary-substituted)alkoxysilanes UNION CARBIDE CORPORATION (US) 1986-07-30 EP claimed
US-4579965-A Process for preparing vinyl-tri-(tertiary substituted) alkoxysilanes UNION CARBIDE CORPORATION (US) 1986-04-01 US claimed
CN-113053740-B Semiconductor device and method for manufacturing the same 台湾积体电路制造股份有限公司 2025-02-07 CN disclosed
US-8968458-B2 Composition for resist underlayer film and process for producing same JSR CORPORATION (JP) 2015-03-03 US disclosed
US-8808446-B2 Composition for resist underlayer film and process for producing same JSR CORPORATION (JP) 2014-08-19 US disclosed
US-8758854-B2 Process for producing sugar-plum-shaped particle NIKKO RICA CORPORATION (JP) 2014-06-24 US disclosed
US-20110034615-A1 PROCESS FOR PRODUCING SUGAR-PLUM-SHAPED PARTICLE NIKKO RICA CORPORATION (JP) 2011-02-10 US disclosed
US-20100151384-A1 COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME JSR CORPORATION (JP) 2010-06-17 US disclosed
US-20090050020-A1 COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME JSR CORPORATION (JP) 2009-02-26 US disclosed
EP-1855159-A1 COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME JSR Corporation (JP) 2007-11-14 EP disclosed
EP-0189197-B1 PROCESS FOR PREPARING VINYL-TRI-(TERTIARY-SUBSTITUTED)ALKOXYSILANES UNION CARBIDE CORPORATION (US) 1990-05-30 EP disclosed
EP-0189197-A2 Process for preparing vinyl-tri-(tertiary-substituted)alkoxysilanes UNION CARBIDE CORPORATION (US) 1986-07-30 EP disclosed
US-4579965-A Process for preparing vinyl-tri-(tertiary substituted) alkoxysilanes UNION CARBIDE CORPORATION (US) 1986-04-01 US disclosed