SCHEMBL214325

SCHEMBL214325

CCC1(COCC(COCC2(CC)COC2)(COCC2(CC)COC2)COCC2(CC)COC2)COC1

nearest known ligand 0.32

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.32
POLB P06746 1/20 0.31
HSD17B10 Q99714 1/20 0.31
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13219673 0.98 TSHR (0.31) TSHRPOLBHSD17B10MEN1KMT2A
SCHEMBL21384583 0.93
SCHEMBL14168875 0.92 TSHR (0.31) TSHR
SCHEMBL213181 0.92 MEN1 (0.32) TSHRMEN1KMT2A
SCHEMBL24831046 0.91
SCHEMBL13219670 0.91 EPHX1 (0.36)
SCHEMBL13219664 0.90 MEN1 (0.32) TSHRMEN1KMT2A
SCHEMBL21555659 0.89 EPHX1 (0.31) TSHRPOLBHSD17B10MEN1KMT2A
SCHEMBL216628 0.89 EPHX1 (0.33) TSHRPOLBHSD17B10MEN1KMT2A
SCHEMBL21551816 0.87 EPHX1 (0.32) TSHRPOLBHSD17B10MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 323 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024095904-A1 ADHESIVE FOR OPTICAL IMAGE FORMATION DEVICE, CURED RESIN ARTICLE, OPTICAL ELEMENT, AND OPTICAL IMAGE FORMATION DEVICE 三井化学株式会社 2024-05-10 WO disclosed
WO-2024095927-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED RELIEF PATTERN USING SAME, AND METHOD FOR PRODUCING POLYIMIDE FILM USING SAME 旭化成株式会社 2024-05-10 WO disclosed
US-11970596-B2 Photopolymerizable compositions and reaction products thereof 3M INNOVATIVE PROPERTIES COMPANY (US) 2024-04-30 US disclosed
US-11961636-B2 Silica-containing insulating composition NISSAN CHEMICAL CORPORATION (JP) 2024-04-16 US disclosed
EP-3010943-B1 CURABLE COMPOSITION, FILM, AND METHOD OF PRODUCING FILM CANON KK (JP) 2024-04-03 EP disclosed
WO-2024038761-A1 CURED PRODUCT, ARTICLE PROVIDED WITH CURED PRODUCT, AND METHOD FOR LESSENING INTERNAL STRESS OF CURED PRODUCT 株式会社カネカ 2024-02-22 WO disclosed
WO-2024024620-A1 SEALING MATERIAL FOR DISPLAY DEVICE, SEALING MATERIAL, ORGANIC EL DISPLAY, AND LED DISPLAY 三井化学株式会社 2024-02-01 WO disclosed
WO-2024005037-A1 DISPLAY DEVICE 三井化学株式会社 2024-01-04 WO disclosed
US-11857385-B2 Method of producing plate denture, curable composition for stereolithography, and plate denture production kit TOKUYAMA DENTAL CORPORATION (JP) 2024-01-02 US disclosed
WO-2023248661-A1 PHOTOSENSITIVE COMPOSITION, HOLOGRAPHIC RECORDING MEDIUM, HOLOGRAPHIC OPTICAL ELEMENT, OPTICAL APPARATUS AND ELECTRONIC DEVICE ソニーグループ株式会社 2023-12-28 WO disclosed
EP-1277776-A1 Photocurable resin composition for sealing material and method of sealing Mitsui Chemicals, Inc. (JP) 2003-01-22 EP disclosed
EP-1254193-A1 REACTIVE PARTICLES, CURABLE COMPOSITION COMPRISING THE SAME AND CURED PRODUCTS DSM N.V. (NL) 2002-11-06 EP disclosed
US-6368769-B1 PHOTOPOLYMERIZATION ASAHI DENKI KOGYO KABUSHIKI KAISHA (JP) 2002-04-09 US disclosed
US-6365644-B1 TO PROVIDE CURED PRODUCT HAVING MECHANICAL STRENGTH AND MINIMIZED SHRINKAGE DURING CURING TO ENSURE HIGH DIMENSIONAL ACCURACY DSM N.V. (NL) 2002-04-02 US disclosed
WO-2001095030-A2 RESIN COMPOSITION AND THREE-DIMENSIONAL OBJECT DSM N.V. (NL) 2001-12-13 WO disclosed
EP-1138739-A1 PHOTOCURABLE RESIN COMPOSITION FOR SEALING MATERIAL AND METHOD OF SEALING Mitsui Chemicals, Inc. (JP) 2001-10-04 EP disclosed
EP-0848294-B1 Photo-curable resin composition used for photo-fabrication of three-dimensional objects DSM NV (NL) 2001-09-19 EP disclosed
WO-2001048073-A1 REACTIVE PARTICLES, CURABLE COMPOSITION COMPRISING THE SAME AND CURED PRODUCTS DSM N.V. (NL) 2001-07-05 WO disclosed
EP-1036789-A1 NOVEL AROMATIC SULFONIUM COMPOUNDS, PHOTOACID GENERATORS COMPRISING THE SAME, PHOTOPOLYMERIZABLE COMPOSITIONS CONTAINING THE SAME, STEREOLITHOGRAPHIC RESIN COMPOSITIONS, AND STEREOLITHOGRAPHIC PROCESS ASAHI DENKA KOGYO KABUSHIKI KAISHA (JP) 2000-09-20 EP disclosed
EP-0848294-A1 Photo-curable resin composition used for photo-fabrication of three-dimensional objects DSM N.V. (NL) 1998-06-17 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11970596-B2 Photopolymerizable compositions and reaction products thereof CBR1, CBR3, POLL TSHR 2948/4885POLB 234/4885HSD17B10 2491/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.