SCHEMBL21384583

SCHEMBL21384583

CCC1(COCC(COCC2(CC)COC2)(COCC2(CC)COC2)COCC(COCC2(CC)COC2)(COCC2(CC)COC2)COCC2(CC)COC2)COC1.CCC1(COCCOCC2(CC)COC2)COC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13219673 0.94 TSHR (0.31)
SCHEMBL214325 0.93 TSHR (0.32)
SCHEMBL13294319 0.88
SCHEMBL13219664 0.87 MEN1 (0.32)
SCHEMBL213172 0.87 TSHR (0.34)
SCHEMBL21555659 0.86 EPHX1 (0.31)
SCHEMBL213181 0.85 MEN1 (0.32)
SCHEMBL14168875 0.85 TSHR (0.31)
SCHEMBL2830527 0.85 TSHR (0.33)
SCHEMBL2830458 0.85 TSHR (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2019179460-A1 RADIATION-CURABLE GRAVURE INK 常州格林感光新材料有限公司 2019-09-26 WO disclosed
WO-2019179461-A1 RADIATION CURABLE COMPOSITION CONTAINING MODIFIED PIGMENT AND USE THEREOF 常州格林感光新材料有限公司 2019-09-26 WO disclosed