SCHEMBL214383

SCHEMBL214383

C=C[Si](CC)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride SCHEMBL27718730 0.96
SCHEMBL5881394 0.72
SCHEMBL5881371 0.69
Fluoride SCHEMBL27930942 0.67
SCHEMBL5881447 0.65
SCHEMBL5881387 0.61
SCHEMBL575742 0.61
Fluoride SCHEMBL28873284 0.59
SCHEMBL2430668 0.56 TSHR (0.50)
SCHEMBL10862 0.56

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117039156-A Secondary battery electrolyte and secondary battery 合肥市赛纬电子材料有限公司 2023-11-10 CN claimed
US-6423377-B1 None US disclosed
CN-117039156-A Secondary battery electrolyte and secondary battery 合肥市赛纬电子材料有限公司 2023-11-10 CN disclosed
WO-2019189414-A1 NONAQUEOUS ELECTROLYTE SOLUTION AND ELECTRICITY STORAGE DEVICE USING SAME 三菱ケミカル株式会社 2019-10-03 WO disclosed
WO-2019189413-A1 NONAQUEOUS ELECTROLYTE SOLUTION AND ENERGY DEVICE USING SAME 三菱ケミカル株式会社 2019-10-03 WO disclosed
US-9822248-B2 Polysiloxane composition, hardened material and optical device KANEKA CORPORATION (JP) 2017-11-21 US disclosed
US-9688851-B2 Polysiloxane composition, hardened material and optical device KANEKA CORPORATION (JP) 2017-06-27 US disclosed
CN-105985768-A Coated semiconductor nanoparticle and method for manufacturing the same 柯尼卡美能达株式会社 2016-10-05 CN disclosed
US-20150203677-A1 POLYSILOXANE COMPOSITION, HARDENED MATERIAL AND OPTICAL DEVICE KANEKA CORPORATION (JP) 2015-07-23 US disclosed
EP-1907495-B1 ORGANOSILOXANE COMPOSITIONS DOW CORNING (US) 2015-01-21 EP disclosed
WO-2007009871-A2 ORGANOSILOXANE COMPOSITIONS DOW CORNING CORPORATION (US) 2007-01-25 WO disclosed
US-6989420-B2 Coating liquid for producing insulating film having low dielectric constant SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2006-01-24 US disclosed
US-6914119-B2 Heat-resistant polyether, curable polyether, and coating liquid for forming a polyether film SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-07-05 US disclosed
US-20030130391-A1 Coating liquid for producing insulating film having low dielectric constant SUMITOMO CHEMICAL COMPANY, LIMITED 2003-07-10 US disclosed
US-20030060591-A1 Heat-resistant polyether, curable polyether, and coating liquid for forming a polyether film SUMITOMO CHEMICAL COMPANY, LIMITED 2003-03-27 US disclosed
US-6534595-B2 Blend of thermosetting resin, decomposable resin and solvent SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-03-18 US disclosed
EP-1233014-A1 ASYMMETRIC ORGANIC PEROXIDE, CROSSLINKING AGENT COMPRISING THE SAME, AND METHOD OF CROSSLINKING WITH THE SAME NOF CORPORATION (JP) 2002-08-21 EP disclosed
US-6423377-B2 COATING A POLYETHER SOLUTION ON A SUBSTRATE AND EXPOSING TO HEATING; LOW DIELECTRIC CONSTANT; STABILITY SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-07-23 US disclosed
US-20010038887-A1 Coating solution for forming porous organic film SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-11-08 US disclosed
US-20010036511-A1 Method for producing organic insulating film SUMITOMO CHECMICAL COMPANY, LIMITED (JP) 2001-11-01 US disclosed