⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5881394 | 0.80 | — | — | |
| Fluoride SCHEMBL27930934 | 0.79 | TSHR (0.39) | — | |
| SCHEMBL5881371 | 0.72 | — | — | |
| SCHEMBL28148538 | 0.71 | — | — | |
| Fluoride SCHEMBL27930942 | 0.69 | — | — | |
| SCHEMBL214383 | 0.65 | — | — | |
| SCHEMBL5881428 | 0.63 | TSHR (0.38) | — | |
| SCHEMBL5881343 | 0.63 | TSHR (0.38) | — | |
| Fluoride SCHEMBL27718730 | 0.62 | — | — | |
| SCHEMBL8992191 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110312810-A | Sintered material, connection structure, composite particle, bonding composition, and method for producing sintered material | 积水化学工业株式会社 | 2019-10-08 | — | — | CN | disclosed |
| CN-108139286-A | Semiconductor installation binding agent and semiconductor transducer | 积水化学工业株式会社 | 2018-06-08 | — | — | CN | disclosed |
| CN-108138024-A | Particle, connecting material, and connecting structure | 积水化学工业株式会社 | 2018-06-08 | — | — | CN | disclosed |
| CN-107849428-A | Particle, connecting material and connection structural bodies | 积水化学工业株式会社 | 2018-03-27 | — | — | CN | disclosed |
| CN-107849427-A | Particle, connecting material and connection structural bodies | 积水化学工业株式会社 | 2018-03-27 | — | — | CN | disclosed |
| US-6989420-B2 | Coating liquid for producing insulating film having low dielectric constant | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2006-01-24 | — | — | US | disclosed |
| US-6914119-B2 | Heat-resistant polyether, curable polyether, and coating liquid for forming a polyether film | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-07-05 | — | — | US | disclosed |
| US-20030130391-A1 | Coating liquid for producing insulating film having low dielectric constant | SUMITOMO CHEMICAL COMPANY, LIMITED | 2003-07-10 | — | — | US | disclosed |
| US-20030060591-A1 | Heat-resistant polyether, curable polyether, and coating liquid for forming a polyether film | SUMITOMO CHEMICAL COMPANY, LIMITED | 2003-03-27 | — | — | US | disclosed |
| US-6534595-B2 | Blend of thermosetting resin, decomposable resin and solvent | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-03-18 | — | — | US | disclosed |
| US-20010038887-A1 | Coating solution for forming porous organic film | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-11-08 | — | — | US | disclosed |