SCHEMBL214749

SCHEMBL214749

[N-3].[Sc+3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6040017 0.82
SCHEMBL4620206 0.82
SCHEMBL237688 0.82
SCHEMBL1335345 0.82
SCHEMBL30312582 0.71
Water SCHEMBL28852215 0.71
SCHEMBL27717729 0.71
SCHEMBL29538745 0.71
SCHEMBL35987 0.50
SCHEMBL1536205 0.50

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 842 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260117416-A1 Process for Depositing Scandium Nitride by Atomic Layer Deposition Techniques KURT J LESKER COMPANY (US) 2026-04-30 US claimed
EP-4732327-A1 A SEMICONDUCTOR STRUCTURE IQE plc (GB) 2026-04-29 EP claimed
US-20260076116-A1 DIFFUSION SUPPRESSION IN HIGH-TEMPERATURE ANNEALING OF NITRIDES THE GOVERNMENT OF THE UNITED STATES OF AMERICA, AS REPRESENTED BY THE SECRETARY OF THE NAVY (US) 2026-03-12 US claimed
US-12545976-B2 Aluminum-scandium composite, aluminum-scandium composite sputtering target and methods of making Materion Corporation (US) 2026-02-10 US claimed
US-12515945-B2 Thin films and methods of fabrication thereof THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 2026-01-06 US claimed
US-12512137-B2 Multilayered vertical spin-orbit torque devices SAMSUNG ELECTRONICS CO., LTD. (KR) 2025-12-30 US claimed
US-20250362746-A1 SKIN-ATTACHABLE SENSOR SYSTEM AND METHOD FOR TRACKING EYE MOVEMENT AND POSITION UNIVERSITY OF HOUSTON SYSTEM (US) 2025-11-27 US claimed
US-12484232-B2 Ferroelectric memory device and method of fabricating the same TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2025-11-25 US claimed
US-12454491-B2 Nitride piezoelectric body and MEMS device using same NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2025-10-28 US claimed
US-20250294772-A1 FERROELECTRIC MEMORY DEVICE AND METHOD OF FORMING THE SAME TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2025-09-18 US claimed
EP-0615952-A2 Composite ultrafine particles of aluminum nitride and rare earth nitride, method for production and sintered article thereof YKK CORPORATION (JP) 1994-09-21 EP claimed
US-5314364-A Scandate cathode and methods of making it U.S. PHILIPS CORPORATION (US) 1994-05-24 US claimed
CN-1051820-A SCANDATE CATHODE PHILIPS NV (NL) 1991-05-29 CN claimed
EP-0428206-A1 Scandate cathode Koninklijke Philips Electronics N.V. (NL) 1991-05-22 EP claimed
EP-0209648-B1 WAFER BASE FOR SILICON CARBIDE SEMICONDUCTOR DEVICE THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 1990-03-07 EP claimed
US-4767666-A SINGLE CRYSTAL SILICON CARBIDE OVERCOATING SUBSTRATE THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 1988-08-30 US claimed
EP-0222908-A1 WAFER BASE FOR SILICON CARBIDE SEMICONDUCTOR DEVICE Hughes Aircraft Company (US) 1987-05-27 EP claimed
EP-0209648-A1 Wafer base for silicon carbide semiconductor device THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 1987-01-28 EP claimed
WO-1986007194-A1 WAFER BASE FOR SILICON CARBIDE SEMICONDUCTOR DEVICE HUGHES AIRCRAFT COMPANY (US) 1986-12-04 WO claimed
US-4126807-A Gas discharge display device containing source of lanthanum series material in dielectric layer of envelope structure OWENS-ILLINOIS, INC. (US) 1978-11-21 US claimed