SCHEMBL21496053

SCHEMBL21496053

CCCCCCNCC(C)(C)O[SiH3]

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.46
ALDH1A1 P00352 1/20 0.46
EPHX1 P07099 5/20 0.39
ADH1B P00325 1/20 0.39
ADH1C P00326 1/20 0.39
ADH1A P07327 1/20 0.39
ADH4 P08319 1/20 0.39
ADH7 P40394 1/20 0.39
S1PR2 O95136 5/20 0.36
S1PR4 O95977 5/20 0.36
S1PR1 P21453 5/20 0.36
S1PR3 Q99500 5/20 0.36
HRH4 Q9H3N8 1/20 0.36
HRH3 Q9Y5N1 1/20 0.36
S1PR5 Q9H228 1/20 0.36
LMNA P02545 1/20 0.36
SIGMAR1 Q99720 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.34
CYP1A2 P05177 1/20 0.33
CYP2D6 P10635 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21496101 1.00 TSHR (0.46) TSHRALDH1A1EPHX1ADH1BADH1C
SCHEMBL21496028 0.92 TSHR (0.42) TSHRALDH1A1ADH1BADH1CADH1A
SCHEMBL21496058 0.83
SCHEMBL977563 0.77 CA12 (0.39) ALDH1A1LMNACYP2C19
SCHEMBL8418749 0.76 TSHR (0.57) TSHRALDH1A1EPHX1ADH1BADH1C
SCHEMBL8416880 0.76 TSHR (0.57) TSHRALDH1A1EPHX1ADH1BADH1C
SCHEMBL8521009 0.76 TSHR (0.57) TSHRALDH1A1EPHX1ADH1BADH1C
SCHEMBL8418522 0.76 TSHR (0.57) TSHRALDH1A1EPHX1ADH1BADH1C
SCHEMBL8420290 0.76 TSHR (0.57) TSHRALDH1A1EPHX1ADH1BADH1C
SCHEMBL17526606 0.76 TSHR (0.57) TSHRALDH1A1EPHX1ADH1BADH1C

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12240868-B2 Organic silicon compound and production method therefor SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-03-04 US disclosed
EP-3783037-B1 POLYMER HAVING REACTIVE SILICON-CONTAINING GROUP AND PRODUCTION METHOD THEREFOR SHINETSU CHEMICAL CO (JP) 2024-01-10 EP disclosed
CN-111989348-B Polymer having reactive silicon-containing group and method for producing same 信越化学工业株式会社 2023-10-20 CN disclosed
CN-111989333-B Organosilicon compound and method for producing same 信越化学工业株式会社 2023-09-15 CN disclosed
US-11667790-B2 Polymer having reactive silicon-containing group and production method therefor SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-06-06 US disclosed
US-20210163512-A1 ORGANIC SILICON COMPOUND AND PRODUCTION METHOD THEREFOR SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-06-03 US disclosed
US-20210155800-A1 POLYMER HAVING REACTIVE SILICON-CONTAINING GROUP AND PRODUCTION METHOD THEREFOR SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-05-27 US disclosed
EP-3783037-A1 POLYMER HAVING REACTIVE SILICON-CONTAINING GROUP AND PRODUCTION METHOD THEREFOR Shin-Etsu Chemical Co., Ltd. (JP) 2021-02-24 EP disclosed
EP-3783003-A1 ORGANIC SILICON COMPOUND AND PRODUCTION METHOD THEREFOR Shin-Etsu Chemical Co., Ltd. (JP) 2021-02-24 EP disclosed
CN-111989348-A Polymer having reactive silicon-containing group and method for producing same 信越化学工业株式会社 2020-11-24 CN disclosed
CN-111989333-A Organosilicon compound and method for producing same 信越化学工业株式会社 2020-11-24 CN disclosed
WO-2020070984-A1 ROOM-TEMPERATURE-CURABLE RESIN COMPOSITION, COATING AGENT, ADHESIVE, AND SEALING AGENT, AND ARTICLE 信越化学工業株式会社 2020-04-09 WO disclosed
WO-2019202796-A1 POLYMER HAVING REACTIVE SILICON-CONTAINING GROUP AND PRODUCTION METHOD THEREFOR 信越化学工業株式会社 2019-10-24 WO disclosed
WO-2019202795-A1 ORGANIC SILICON COMPOUND AND PRODUCTION METHOD THEREFOR 信越化学工業株式会社 2019-10-24 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210163512-A1 ORGANIC SILICON COMPOUND AND PRODUCTION METHOD THEREFOR OR51E2, MSL1, SOS1 TSHR 4456/4885ALDH1A1 2353/4885EPHX1 3279/4885
US-12240868-B2 Organic silicon compound and production method therefor OR51E2, MSL1, SOS1 TSHR 4456/4885ALDH1A1 2353/4885EPHX1 3279/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.