SCHEMBL21500828

SCHEMBL21500828

O=C(Oc1cccc2c(O)cccc12)c1c(I)ccc(I)c1I

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ESR1 P03372 13/20 0.57
▸ ESR2 Q92731 13/20 0.57
▸ KMT2A Q03164 8/20 0.57
▸ MEN1 O00255 5/20 0.57
▸ GAA P10253 5/20 0.57
▸ HSD17B10 Q99714 4/20 0.57
▸ SMN1; SMN2 Q16637 2/20 0.57
▸ JAK2 O60674 1/20 0.57
▸ USP2 O75604 1/20 0.57
▸ MAPT P10636 1/20 0.57
▸ ALOX15 P16050 1/20 0.57
▸ NPSR1 Q6W5P4 1/20 0.57
▸ POLB P06746 2/20 0.51
▸ PARP1 P09874 1/20 0.36
▸ ALDH1A1 P00352 2/20 0.36
▸ KDM4E B2RXH2 1/20 0.36
▸ HPGD P15428 1/20 0.36
▸ CA12 O43570 1/20 0.35
▸ CA1 P00915 1/20 0.35
▸ CA2 P00918 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21500898 0.84 KMT2A (0.46) ESR1ESR2KMT2AMEN1GAA
SCHEMBL21500836 0.81 KMT2A (0.41) ESR1ESR2KMT2AMEN1GAA
SCHEMBL22945089 0.78 ESR1 (0.42) ESR1ESR2KMT2AMEN1GAA
SCHEMBL21705802 0.78 IDO1 (0.42) ESR1ESR2KMT2AMEN1GAA
SCHEMBL22945092 0.78 FABP7 (0.42) ESR1ESR2KMT2AMEN1GAA
SCHEMBL21500835 0.77 ESR1 (0.48) ESR1ESR2KMT2AMEN1GAA
SCHEMBL21500923 0.77 KMT2A (0.44) ESR1ESR2KMT2AMEN1GAA
SCHEMBL21500857 0.75 SERPINE1 (0.34) POLB
SCHEMBL20502499 0.74 ESR1 (0.62) ESR1ESR2KMT2AMEN1GAA
SCHEMBL21705807 0.74 SMN1; SMN2 (0.46) KMT2AHSD17B10SMN1; SMN2MAPTPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11156916-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-10-26 — — US disclosed
US-20190324368-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-10-24 — — US disclosed
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