SCHEMBL22945092

SCHEMBL22945092

O=C(Oc1ccccc1I)c1c(I)ccc(I)c1I

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ FABP7 O15540 1/20 0.42
▸ FABP3 P05413 1/20 0.42
▸ FABP5 Q01469 1/20 0.42
▸ KMT2A Q03164 8/20 0.37
▸ MAPT P10636 2/20 0.37
▸ SMN1; SMN2 Q16637 2/20 0.37
▸ SERPINE1 P05121 1/20 0.36
▸ PTPN2 P17706 2/20 0.35
▸ PTPN1 P18031 2/20 0.35
▸ PTPRF P10586 1/20 0.35
▸ HSD17B10 Q99714 5/20 0.34
▸ KDM4E B2RXH2 2/20 0.34
▸ ALDH1A1 P00352 1/20 0.34
▸ HPGD P15428 1/20 0.34
▸ LMNA P02545 2/20 0.33
▸ CYP1A2 P05177 1/20 0.33
▸ CYP2C9 P11712 1/20 0.33
▸ SLC6A3 Q01959 1/20 0.33
▸ GAA P10253 2/20 0.33
▸ NPC1 O15118 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21500898 0.86 KMT2A (0.46) KMT2AMAPTSMN1; SMN2SERPINE1HSD17B10
SCHEMBL21705807 0.85 SMN1; SMN2 (0.46) FABP7FABP3FABP5KMT2AMAPT
SCHEMBL21500923 0.78 KMT2A (0.44) KMT2AMAPTSMN1; SMN2SERPINE1HSD17B10
SCHEMBL22995064 0.78 NCEH1 (0.57) KMT2AMAPTSMN1; SMN2HSD17B10ALDH1A1
SCHEMBL21500828 0.78 ESR1 (0.57) KMT2AMAPTSMN1; SMN2HSD17B10KDM4E
SCHEMBL21500836 0.77 KMT2A (0.41) KMT2AMAPTSMN1; SMN2SERPINE1HSD17B10
SCHEMBL21705802 0.77 IDO1 (0.42) KMT2AMAPTSMN1; SMN2HSD17B10GAA
SCHEMBL22945089 0.77 ESR1 (0.42) KMT2AMAPTSMN1; SMN2HSD17B10LMNA
SCHEMBL21500857 0.76 SERPINE1 (0.34) SERPINE1POLB
SCHEMBL3150774 0.75 FABP7 (0.47) FABP7FABP3FABP5KMT2AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210033970-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-02-04 — — US disclosed
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