SCHEMBL21526655

SCHEMBL21526655

C=CC(=O)Oc1ccc(C(=O)OCc2ccccc2)cc1

nearest known ligand 0.63

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 4/20 0.63
▸ TDP1 Q9NUW8 4/20 0.63
▸ SLC6A2 P23975 1/20 0.63
▸ SLC6A3 Q01959 1/20 0.63
▸ LMNA P02545 3/20 0.62
▸ MAPT P10636 4/20 0.55
▸ ALDH1A1 P00352 3/20 0.55
▸ HPGD P15428 1/20 0.55
▸ RAB9A P51151 2/20 0.50
▸ GAA P10253 1/20 0.50
▸ MEN1 O00255 1/20 0.50
▸ NPC1 O15118 1/20 0.48
▸ SMN1; SMN2 Q16637 1/20 0.48
▸ THRB P10828 2/20 0.48
▸ TSHR P16473 1/20 0.47
▸ ESR1 P03372 1/20 0.47
▸ ESR2 Q92731 1/20 0.47
▸ NR4A1 P22736 1/20 0.46
▸ NR4A2 P43354 1/20 0.46
▸ NR4A3 Q92570 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9696121 0.86 KMT2A (0.73) KMT2ATDP1SLC6A2SLC6A3LMNA
SCHEMBL10344103 0.86 KMT2A (0.73) KMT2ATDP1SLC6A2SLC6A3LMNA
SCHEMBL25119461 0.85 THRB (0.68) KMT2ATDP1SLC6A2SLC6A3LMNA
SCHEMBL27823711 0.84 THRB (0.57) KMT2ATDP1SLC6A2SLC6A3LMNA
SCHEMBL10597179 0.84 KMT2A (0.71) KMT2ATDP1SLC6A2SLC6A3LMNA
SCHEMBL8198304 0.84 KMT2A (0.77) KMT2ATDP1SLC6A2SLC6A3LMNA
SCHEMBL27804950 0.83 THRB (0.57) KMT2ATDP1SLC6A2SLC6A3LMNA
Benzyl Benzoate SCHEMBL28164571 0.83 KMT2A (0.79) KMT2ATDP1SLC6A2SLC6A3LMNA
SCHEMBL29266081 0.82 THRB (0.46) KMT2ATDP1SLC6A2SLC6A3LMNA
SCHEMBL13859711 0.82 TSHR (0.48) KMT2ATDP1SLC6A2SLC6A3LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023058418-A1 COMPOSITION, AND PHOTOSENSITIVE COMPOSITION 東京応化工業株式会社 2023-04-13 — — WO disclosed
EP-3800176-A1 NOVEL POLYMERISABLE MONOMERS AND THEIR USE AS REACTIVE DILUENTS IN CURABLE COMPOSITIONS Align Technology, Inc. (US) 2021-04-07 — — EP disclosed
EP-3564206-B1 NOVEL POLYMERISABLE MONOMERS AND THEIR USE AS REACTIVE DILUENTS IN CURABLE COMPOSITIONS ALIGN TECHNOLOGY INC (US) 2020-11-04 — — EP disclosed
EP-3564206-A1 NOVEL POLYMERISABLE MONOMERS AND THEIR USE AS REACTIVE DILUENTS IN CURABLE COMPOSITIONS Align Technology, Inc. (US) 2019-11-06 — — EP disclosed
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