Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAOA | P21397 | 5/20 | 0.42 |
| ▸ | IDO1 | P14902 | 4/20 | 0.42 |
| ▸ | CDC25B | P30305 | 3/20 | 0.42 |
| ▸ | MAOB | P27338 | 3/20 | 0.42 |
| ▸ | SNCA | P37840 | 2/20 | 0.42 |
| ▸ | EHMT2 | Q96KQ7 | 2/20 | 0.42 |
| ▸ | AKT1 | P31749 | 1/20 | 0.42 |
| ▸ | MAP2K1 | Q02750 | 1/20 | 0.42 |
| ▸ | PIN1 | Q13526 | 1/20 | 0.42 |
| ▸ | NSD1 | Q96L73 | 1/20 | 0.42 |
| ▸ | EHMT1 | Q9H9B1 | 1/20 | 0.42 |
| ▸ | MEN1 | O00255 | 5/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.39 |
| ▸ | MAPT | P10636 | 5/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 5/20 | 0.38 |
| ▸ | LMNA | P02545 | 4/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.38 |
| ▸ | PTPRC | P08575 | 3/20 | 0.38 |
| ▸ | POLB | P06746 | 3/20 | 0.38 |
| ▸ | RECQL | P46063 | 3/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL415465 | 0.86 | MEN1 (0.42) | MAOAIDO1CDC25BMAOBSNCA | |
| SCHEMBL8366579 | 0.78 | CDC25B (0.32) | MAOAIDO1CDC25BMAOBSNCA | |
| SCHEMBL223194 | 0.75 | IDO1 (0.48) | MAOAIDO1CDC25BMAOBSNCA | |
| SCHEMBL10522276 | 0.67 | CDC25B (0.50) | MAOAIDO1CDC25BMAOBSNCA | |
| SCHEMBL577831 | 0.63 | CDC25B (0.58) | MAOAIDO1CDC25BMAOBSNCA | |
| SCHEMBL110858 | 0.61 | — | — | |
| SCHEMBL624689 | 0.60 | MEN1 (0.39) | MAOAIDO1CDC25BMAOBSNCA | |
| Naphthoquinone SCHEMBL11359780 | 0.60 | IDO1 (1.00) | MAOAIDO1CDC25BMAOBSNCA | |
| SCHEMBL102781 | 0.60 | MEN1 (0.37) | MAOAIDO1CDC25BMAOBSNCA | |
| Naphthoquinone SCHEMBL29354680 | 0.60 | IDO1 (1.00) | MAOAIDO1CDC25BMAOBSNCA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9568824-B2 | Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith | FUJIFILM CORPORATION (JP) | 2017-02-14 | — | — | US | disclosed |
| US-9557643-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same and electronic device | FUJIFILM CORPORATION (JP) | 2017-01-31 | — | — | US | disclosed |
| EP-2413191-B1 | Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith | FUJIFILM CORP (JP) | 2016-09-07 | — | — | EP | disclosed |
| US-9429840-B2 | Pattern forming method, composition used therein, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2016-08-30 | — | — | US | disclosed |
| US-9223208-B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition | FUJIFILM CORPORATION (JP) | 2015-12-29 | — | — | US | disclosed |
| US-9090722-B2 | Chemical amplification resist composition, and mold preparation method and resist film using the same | FUJIFILM CORPORATION (JP) | 2015-07-28 | — | — | US | disclosed |
| US-20150118627-A1 | PATTERN FORMING METHOD, COMPOSITION USED TEHREIN, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-04-30 | — | — | US | disclosed |
| US-9005870-B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition | FUJIFILM CORPORATION (JP) | 2015-04-14 | — | — | US | disclosed |
| US-20140349224-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2014-11-27 | — | — | US | disclosed |
| US-8808961-B2 | Composition, resist film, pattern forming method, and inkjet recording method | FUJIFILM CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| EP-1367439-A1 | Radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-12-03 | — | — | EP | disclosed |
| US-6602646-B1 | Acid generator and copolymer resin having alkali soluble and alicyclic hydrocarbon moieties; eliminates edge roughness on pattern | FUJI PHOTO FILM CO., LTD. (JP) | 2003-08-05 | — | — | US | disclosed |
| US-6596458-B1 | Used in an ultramicrolithography process or another photofabrication process for the production of very large scale integrated circuits or high capacity microchips | FUJI PHOTO FILM CO., LTD. (JP) | 2003-07-22 | — | — | US | disclosed |
| US-6576392-B1 | A photoacid gererator, a resin containing a sulfonate group, and a compound containing a sulfonate group which decomposes by the action of an acid to generate a sulfonic acid | FUJI PHOTO FILM CO., LTD. (JP) | 2003-06-10 | — | — | US | disclosed |
| US-20030073029-A1 | Positive-working resist composition | FUJI PHOTO FILM CO., LTD. | 2003-04-17 | — | — | US | disclosed |
| US-20030044715-A1 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. | 2003-03-06 | — | — | US | disclosed |
| US-20030031950-A1 | A compound capable of generating an acid upon irradiation; a resin capable of decomposing by the action of an acid to increase the solubility; and a specified dissolution-inhibiting compound. | FUJI PHOTO FILM CO., LTD | 2003-02-13 | — | — | US | disclosed |
| US-20030008241-A1 | Positive-working resist composition | FUJI PHOTO FILM CO., LTD. | 2003-01-09 | — | — | US | disclosed |
| US-6479211-B1 | FOR FAR ULTRAVIOLET EXPOSURE, WHICH CAN FORM A HIGHLY PRECISE PATTERN USING LIGHT IN THE FAR ULTRAVIOLET REGION INCLUDING AN EXCIMER LASER RAY, PARTICULARLY, IN THE REGION OF 250 NM OR LESS | FUJI PHOTO FILM CO., LTD. (JP) | 2002-11-12 | — | — | US | disclosed |
| EP-1091248-A1 | Postive-working resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2001-04-11 | — | — | EP | disclosed |