SCHEMBL216462

SCHEMBL216462

CN(O)c1ccccc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28771745 0.97 MEN1 (0.46)
Hydrochloric Acid SCHEMBL27448790 0.97 MEN1 (0.46)
Hydrochloric Acid SCHEMBL27370053 0.97 MEN1 (0.46)
SCHEMBL763661 0.84 TAAR1 (0.46)
SCHEMBL10579168 0.83 ALDH1A1 (0.50)
Fluoride SCHEMBL29286922 0.78 ALDH1A1 (0.62)
Fluoride SCHEMBL10902270 0.75 ALDH1A1 (0.59)
Methyl Alcohol SCHEMBL28992242 0.75 ALDH1A1 (0.59)
Ethane SCHEMBL9330415 0.75 NPSR1 (0.43)
Methyl Alcohol SCHEMBL27369418 0.75 CHKA (0.48)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 196 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1906155-A Novel hydroxamic acid esters and pharmaceutical use thereof LEO PHARMA AS (DK) 2007-01-31 CN claimed
US-5087684-A Containing inorganic filler, organofunctional silane, substituted hydroxylamine; storage stability RHONE-POULENC CHIMIE (FR) 1992-02-11 US claimed
EP-0213091-A1 Use of compounds for the manufacture of a medicament for the treatment of cataract Testa, Michele (IT) 1987-03-04 EP claimed
US-20250004378-A1 Pattern Forming Method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-01-02 US disclosed
EP-4474912-A2 PATTERN FORMING METHOD Shin-Etsu Chemical Co., Ltd. (JP) 2024-12-11 EP disclosed
EP-4474911-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-12-11 EP disclosed
US-20240402606-A1 Composition For Forming Resist Underlayer Film And Patterning Process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-12-05 US disclosed
US-20240337944-A1 Resist Underlayer Film Material, Pattern Forming Method, And Method Of Forming Resist Underlayer Film SHIN- ETSU CHEMICAL CO., LTD. (JP) 2024-10-10 US disclosed
EP-4425261-A1 RESIST UNDERLAYER FILM MATERIAL, PATTERN FORMING METHOD, AND METHOD OF FORMING RESIST UNDERLAYER FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-09-04 EP disclosed
US-20230400770-A1 Resist Underlayer Film Material, Patterning Process, And Method For Forming Resist Underlayer Film SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-14 US disclosed
EP-4290309-A1 RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-13 EP disclosed
US-4211729-A Compositions containing diorganopolysiloxanes CONSORTIUM FUR ELEKTROCHEMISCHE INDUSTRIE, GMBH (DE) 1980-07-08 US disclosed
US-4191714-A CONTAINING SILYL GROUP ON SIDE CHAIN OR POLYMER END KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1980-03-04 US disclosed
US-4161572-A HYDROSILYLATION KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1979-07-17 US disclosed
US-4152343-A REACTING AN ORGANIC SILICATE OR SILANETRIOL DERIVATIVE WITH A DIALKYLTIN CAROXYLIC ACID SALT WACKER-CHEMIE GMBH (DE) 1979-05-01 US disclosed
US-4137249-A Silicon-tin compounds WACKER-CHEMIE GMBH (DE) 1979-01-30 US disclosed
US-4102860-A ROOM TEMPERATURE CURING WACKER-CHEMIE GMBH (DE) 1978-07-25 US disclosed
US-4076684-A GLASS FIBERS; CURABLE WACKER-CHEMIE GMBH (DT) 1978-02-28 US disclosed
US-4045602-A ADHESION OF ORGANOPOLYSILOXANE ELASTOMERS TO SUBSTRATES WACKER-CHEMIE GMBH (DT) 1977-08-30 US disclosed
US-4026853-A Curable bituminous organopolysiloxane compositions CONSORTIUM FUR ELEKTROCHEMISCHE INDUSTRIE GMBH (DT) 1977-05-31 US disclosed