SCHEMBL216468

SCHEMBL216468

C=C(C)C(=O)OC(C)OC(C)C

nearest known ligand 0.43

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.43
ALDH1A1 P00352 2/20 0.42
THRB P10828 1/20 0.32
TDP1 Q9NUW8 1/20 0.31
CHRM2 P08172 1/20 0.30
CHRM4 P08173 1/20 0.30
CHRM1 P11229 1/20 0.30
TBXA2R P21731 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7634557 0.96 TSHR (0.41) TSHRALDH1A1THRB
SCHEMBL4096632 0.91 TSHR (0.46) TSHRALDH1A1THRBTDP1
SCHEMBL13126153 0.88 TSHR (0.45) TSHRALDH1A1THRBTDP1
SCHEMBL538063 0.85 TSHR (0.50) TSHRALDH1A1THRBTDP1CHRM2
SCHEMBL10350826 0.84 TSHR (0.42) TSHRALDH1A1THRB
SCHEMBL8494461 0.84 TSHR (0.42) TSHRALDH1A1THRBTDP1CHRM2
SCHEMBL270315 0.84 TSHR (0.42) TSHRALDH1A1THRB
SCHEMBL269141 0.84 ALDH1A1 (0.46) TSHRALDH1A1THRB
SCHEMBL6904341 0.83 TSHR (0.48) TSHRALDH1A1THRBTDP1
SCHEMBL27993745 0.83 TSHR (0.35) TSHRALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 168 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1776399-B1 MONODISPERSE POLYMERS CONTAINING (ALKYL)ACRYLIC ACID MOIETIES, PRECURSORS AND METHODS FOR MAKING THEM AND THEIR APPLICATIONS UNIV GENT (BE) 2012-11-14 EP claimed
EP-4112676-B1 METHOD FOR PRODUCING NITRILE RUBBER ZEON CORP (JP) 2026-02-18 EP disclosed
EP-3904430-B1 METHOD FOR RECYCLING NITRILE RUBBER ZEON CORP (JP) 2025-12-03 EP disclosed
US-12404350-B2 Method for producing nitrile rubber ZEON CORPORATION (JP) 2025-09-02 US disclosed
US-12351716-B2 Method for recycling nitrile rubber ZEON CORPORATION (JP) 2025-07-08 US disclosed
US-20250206862-A1 CAVITY FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2025-06-26 US disclosed
US-20250206924-A1 LATEX COMPOSITION AND DIP-MOLDED BODY ZEON CORPORATION (JP) 2025-06-26 US disclosed
US-12331197-B2 Power transmission belt DAYCO EUROPE S.R.L. (IT) 2025-06-17 US disclosed
US-20250136734-A1 PROTECTIVE-FILM FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2025-05-01 US disclosed
WO-2025028232-A1 CROSSLINKABLE RUBBER COMPOSITION, CROSSLINKED RUBBER OBJECT, AND SEALING MATERIAL 日本ゼオン株式会社 2025-02-06 WO disclosed
CN-1768306-A Underlayer coating forming composition for lithography containing epoxy compound and carboxylic acid compound NISSAN CHEMICAL IND LTD (JP) 2006-05-03 CN disclosed
EP-1617289-A1 COMPOSITION FOR FORMATION OF UNDERLAYER FILM FOR LITHOGRAPHY CONTAINING EPOXY COMPOUND AND CARBOXYLIC ACID COMPOUND Nissan Chemical Industries, Ltd. (JP) 2006-01-18 EP disclosed
WO-2006002496-A1 MONODISPERSE POLYMERS CONTAINING (ALKYL)ACRYLIC ACID MOIETIES, PRECURSORS AND METHODS FOR MAKING THEM AND THEIR APPLICATIONS UNIVERSITEIT GENT (BE) 2006-01-12 WO disclosed
CN-1630835-A Acid-decomposable resin composition containing ketone-aldehyde copolymer NIPPON SODA CO (JP) 2005-06-22 CN disclosed
CN-1207633-C Positive film type light sensitiveness anticorrosion additive compsn. and application thereof MITSUI CHEMICALS INC (JP) 2005-06-22 CN disclosed
US-20050130057-A1 Acid-degradable resin compositions containing ketene-aldehyde copolymer NIPPON SODA CO., LTD. (JP) 2005-06-16 US disclosed
EP-1482361-A1 ACID-DEGRADABLE RESIN COMPOSITIONS CONTAINING KETENE-ALDEHYDE COPOLYMER NIPPON SODA CO., LTD. (JP) 2004-12-01 EP disclosed
EP-1308312-A1 THERMO-SENSITIVE RECORDING TYPE LITHOGRAPHICAL BLOCK MATERIAL, METHOD OF MAKING UP LITHOGRAPHICAL BLOCK, AND LITHOGRAPHICAL BLOCK MADE UP BY THE MAKING UP METHOD Labo Co., Ltd (JP) 2003-05-07 EP disclosed
CN-1397841-A Positive film type light sensitiveness anticorrosion additive compsn. and application thereof MITSUI CHEMICALS INC (JP) 2003-02-19 CN disclosed
US-4272617-A Immobilization of enzymes or bacteria cells JAPAN ATOMIC ENERGY RESEARCH INSTITUTE (JP) 1981-06-09 US disclosed