Ammonia Solution, Strong

Ammonia Solution, Strong

SCHEMBL21647258

N.ONc1cccc2ccccc12

nearest known ligand 0.55

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 5/20 0.55
GAA P10253 3/20 0.55
ALDH1A1 P00352 4/20 0.54
TSHR P16473 3/20 0.54
HSD17B10 Q99714 3/20 0.54
CYP3A4 P08684 2/20 0.54
HPGD P15428 2/20 0.54
TP53 P04637 1/20 0.54
ALOX15 P16050 1/20 0.54
CDC25B P30305 1/20 0.54
ATM Q13315 1/20 0.54
NPC1 O15118 3/20 0.50
RAB9A P51151 3/20 0.50
CYP1A2 P05177 2/20 0.50
CYP2D6 P10635 1/20 0.50
CYP2C9 P11712 1/20 0.50
CYP2C19 P33261 1/20 0.50
MAPT P10636 3/20 0.48
CA12 O43570 2/20 0.48
CA14 Q9ULX7 2/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ammonia Solution, Strong SCHEMBL9388326 1.00 KDM4E (0.55) KDM4EGAAALDH1A1TSHRHSD17B10
SCHEMBL29560886 0.98 KDM4E (0.57) KDM4EGAAALDH1A1TSHRHSD17B10
SCHEMBL2166547 0.98 KDM4E (0.57) KDM4EGAAALDH1A1TSHRHSD17B10
4-Aminophenol SCHEMBL7023770 0.81 KDM4E (0.47) KDM4EGAAALDH1A1TSHRHSD17B10
Ammonia Solution, Strong SCHEMBL11586421 0.80 HSD17B10 (0.71) KDM4EGAAALDH1A1TSHRHSD17B10
Trifluoromethanesulfonic Acid SCHEMBL28625758 0.80 HDAC1 (0.51) KDM4EGAAALDH1A1TSHRHSD17B10
SCHEMBL21647257 0.79 KDM4E (0.53) KDM4EGAAALDH1A1TSHRHSD17B10
Hydrochloric Acid SCHEMBL10337880 0.77 KDM4E (0.52) KDM4EGAAALDH1A1TSHRHSD17B10
SCHEMBL49213 0.77 HSD17B10 (0.74) KDM4EGAAALDH1A1TSHRHSD17B10
SCHEMBL7915675 0.77 ALDH1A1 (0.60) KDM4EGAAALDH1A1TSHRHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 82 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116841122-B Photosensitive resin composition and preparation method and application thereof 波米科技有限公司 2024-01-30 CN claimed
CN-116841122-A Photosensitive resin composition and preparation method and application thereof 波米科技有限公司 2023-10-03 CN claimed
CN-114488690-A Chemical amplification type negative polyimide photoresist and preparation method and application thereof 中国科学院化学研究所 2022-05-13 CN claimed
CN-111522200-B Negative PSPI resin for 12-inch silicon wafer and preparation method and application thereof 中国科学院化学研究所 2021-07-27 CN claimed
CN-111522200-A Negative PSPI resin for 12-inch silicon wafer and preparation method and application thereof 中国科学院化学研究所 2020-08-11 CN claimed
CN-104492377-B A kind of method preparing charcoal granular absorption mercury ions in waste water via chicken manure 青岛农业大学 2016-08-31 CN claimed
CN-104445752-B A kind of method preparing charcoal granular absorption mercury ions in waste water via branch of poplar QINGDAO AGRICULTURAL UNIVERSITY (CN) 2016-03-16 CN claimed
CN-104556290-B A kind of method preparing charcoal granular absorption Cu in waste water ion via cow dung QINGDAO AGRICULTURAL UNIVERSITY (CN) 2016-03-02 CN claimed
CN-104556290-A Method for adsorbing copper ions in waste water by carbon particle prepared from cow dung UNIV QINGDAO AGRICULTURAL 2015-04-29 CN claimed
CN-104492377-A Method for adsorbing mercury ions in wastewater by carbon granules prepared by chicken manure UNIV QINGDAO AGRICULTURAL 2015-04-08 CN claimed
CN-104445752-A Method for adsorbing mercury ions in waste water by means of charcoal particles made from poplar branches UNIV QINGDAO AGRICULTURAL 2015-03-25 CN claimed
CN-100435934-C Organic complex supported activated carbon adsorbent and its preparation method and application UNIV SOUTH CHINA TECH (CN) 2008-11-26 CN claimed
CN-101053820-A Organic complex supported activated carbon adsorbent and its preparation method and application UNIV SOUTH CHINA TECH (CN) 2007-10-17 CN claimed
CN-114008526-B Curable resin composition, method for producing curable resin composition, cured film, laminate, method for producing cured film, and semiconductor device 富士胶片株式会社 2024-11-08 CN disclosed
CN-118302485-A Resin composition 日产化学株式会社 2024-07-05 CN disclosed
CN-118244580-A Photosensitive resin composition, cured film using same, method for producing same, and semiconductor device 旭化成株式会社 2024-06-25 CN disclosed
CN-102162996-B Manufacture method for negative type photosensitive resin composition and cured relief pattern ASAHI KASEI E MATERIALS CORP 2013-07-17 CN disclosed
CN-102162996-A Manufacture method for negative type photosensitive resin composition and cured relief pattern ASAHI KASEI E MATERIALS CORP 2011-08-24 CN disclosed
CN-100435934-C Organic complex supported activated carbon adsorbent and its preparation method and application UNIV SOUTH CHINA TECH (CN) 2008-11-26 CN disclosed
CN-101053820-A Organic complex supported activated carbon adsorbent and its preparation method and application UNIV SOUTH CHINA TECH (CN) 2007-10-17 CN disclosed