SCHEMBL21668241

SCHEMBL21668241

OC1CCC(CC2CCC(O)C(O)C2O)CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18096501 0.77 TSHR (0.35) —
SCHEMBL17029872 0.73 — —
SCHEMBL151744 0.72 TSHR (0.41) —
SCHEMBL9815822 0.72 TSHR (0.41) —
SCHEMBL20913172 0.72 TSHR (0.31) —
SCHEMBL22180866 0.71 SHBG (0.32) —
SCHEMBL8863453 0.71 CA1 (0.45) —
SCHEMBL27939663 0.69 — —
SCHEMBL15484213 0.69 TSHR (0.44) —
SCHEMBL22631740 0.69 GBA1 (0.41) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2020026834-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION 日産化学株式会社 2020-02-06 — — WO disclosed
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