⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7105090 | 0.85 | SMN1; SMN2 (0.46) | — | |
| SCHEMBL128269 | 0.80 | — | — | |
| SCHEMBL13640440 | 0.80 | CA1 (0.45) | — | |
| SCHEMBL231045 | 0.79 | ALDH1A1 (0.40) | — | |
| SCHEMBL168845 | 0.78 | CA1 (0.39) | — | |
| SCHEMBL6744296 | 0.78 | — | — | |
| SCHEMBL12447225 | 0.78 | — | — | |
| SCHEMBL7707505 | 0.78 | SMN1; SMN2 (0.41) | — | |
| SCHEMBL184608 | 0.78 | — | — | |
| SCHEMBL15314124 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9130244-B2 | Nonaqueous electrolyte solution and electrochemical element using same | UBE INDUSTRIES, LTD. (JP) | 2015-09-08 | — | — | US | disclosed |
| EP-2908376-A1 | NONAQUEOUS ELECTROLYTE SOLUTION AND ELECTROCHEMICAL ELEMENT USING SAME | Ube Industries, Ltd. (JP) | 2015-08-19 | — | — | EP | disclosed |
| CN-104795595-A | Nonaqueous electrolyte solution and electrochemical element using same | UBE INDUSTRIES | 2015-07-22 | — | — | CN | disclosed |
| CN-102498605-B | Nonaqueous electrolyte solution and electrochemical element using same | UBE INDUSTRIES | 2015-05-20 | — | — | CN | disclosed |
| EP-2243805-B1 | ANTHRAPYRIDONE COMPOUND OR SALT THEREOF, MAGENTA INK COMPOSITION CONTAINING THE ANTHRAPYRIDONE COMPOUND, AND COLORED BODY | NIPPON KAYAKU KK (JP) | 2014-11-26 | — | — | EP | disclosed |
| EP-2479831-A1 | NONAQUEOUS ELECTROLYTE SOLUTION AND ELECTROCHEMICAL ELEMENT USING SAME | Ube Industries, Ltd. (JP) | 2012-07-25 | — | — | EP | disclosed |
| US-20120171581-A1 | NONAQUEOUS ELECTROLYTE SOLUTION AND ELECTROCHEMICAL ELEMENT USING SAME | UBE INDUSTRIES, LTD. (JP) | 2012-07-05 | — | — | US | disclosed |
| CN-102498605-A | Nonaqueous electrolyte solution and electrochemical element using same | UBE INDUSTRIES | 2012-06-13 | — | — | CN | disclosed |
| US-7985287-B2 | Anthrapyridone compound or a salt thereof, magenta ink composition containing the anthrapyridone compound and colored product | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2011-07-26 | — | — | US | disclosed |
| CN-1969231-B | Method for forming plated product using negative photoresist composition | TOKYO OHKA KOGYO CO LTD | 2011-06-01 | — | — | CN | disclosed |
| US-20100291360-A1 | Anthrapyridone Compound Or A Salt Thereof, Magenta Ink Composition Containing The Anthrapyridone Compound and Colored Product | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2010-11-18 | — | — | US | disclosed |
| EP-2243805-A1 | ANTHRAPYRIDONE COMPOUND OR SALT THEREOF, MAGENTA INK COMPOSITION CONTAINING THE ANTHRAPYRIDONE COMPOUND, AND COLORED BODY | Nippon Kayaku Kabushiki Kaisha (JP) | 2010-10-27 | — | — | EP | disclosed |
| CN-1969231-A | Method for forming plated product using negative photoresist composition and photosensitive composition used in the method | TOKYO OHKA KOGYO CO LTD (JP) | 2007-05-23 | — | — | CN | disclosed |
| US-6414173-B1 | TRANSMETALLATION REACTION, COMPRISING: CONTACTING PALLADIUM CATALYST WITH AROYL, ALKANOYL, OR ARALKANOYL ESTER OF ALLYLIC ALCOHOL; AND HYPERVALENT SILICON SPECIES | UNIVERSITY OF MARYLAND | 2002-07-02 | — | — | US | disclosed |