Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 9/20 | 0.58 |
| ▸ | ESR2 | Q92731 | 8/20 | 0.58 |
| ▸ | PDCD1 | Q15116 | 1/20 | 0.58 |
| ▸ | CD274 | Q9NZQ7 | 1/20 | 0.58 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.57 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.57 |
| ▸ | LMNA | P02545 | 2/20 | 0.57 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.57 |
| ▸ | MAPT | P10636 | 2/20 | 0.57 |
| ▸ | NFKB1 | P19838 | 2/20 | 0.57 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.57 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.57 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.57 |
| ▸ | THPO | P40225 | 2/20 | 0.57 |
| ▸ | BLM | P54132 | 2/20 | 0.57 |
| ▸ | MEN1 | O00255 | 1/20 | 0.57 |
| ▸ | NPC1 | O15118 | 1/20 | 0.57 |
| ▸ | CA12 | O43570 | 1/20 | 0.57 |
| ▸ | GMNN | O75496 | 1/20 | 0.57 |
| ▸ | CA1 | P00915 | 1/20 | 0.57 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31274990 | 1.00 | ESR1 (0.58) | ESR1ESR2PDCD1CD274ALOX15 | |
| SCHEMBL40254 | 1.00 | ESR1 (0.58) | ESR1ESR2PDCD1CD274ALOX15 | |
| Methane SCHEMBL7206625 | 0.97 | ESR1 (0.55) | ESR1ESR2PDCD1CD274ALOX15 | |
| SCHEMBL10445993 | 0.91 | ESR1 (0.65) | ESR1ESR2PDCD1CD274ALOX15 | |
| SCHEMBL4630558 | 0.91 | ESR1 (0.50) | ESR1ESR2PDCD1CD274ALOX15 | |
| SCHEMBL36791 | 0.88 | IDO1 (0.56) | ESR1ESR2PDCD1CD274ALOX15 | |
| SCHEMBL22694327 | 0.88 | IDO1 (0.56) | ESR1ESR2PDCD1CD274ALOX15 | |
| SCHEMBL982047 | 0.88 | IDO1 (0.56) | ESR1ESR2PDCD1CD274ALOX15 | |
| SCHEMBL19314626 | 0.88 | IDO1 (0.56) | ESR1ESR2PDCD1CD274ALOX15 | |
| SCHEMBL23627369 | 0.86 | ESR1 (0.46) | ESR1ESR2PDCD1CD274ALOX15 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 361 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080233438-A1 | Fuel for fuel cell, fuel cell and application thereof | KURITA WATER INDUSTRIES LTD. (JP) | 2008-09-25 | — | — | US | claimed |
| EP-1705740-A1 | FUEL FOR FUEL CELL, FUEL CELL AND APPLICATION THEREOF | Kurita Water Industries Ltd. (JP) | 2006-09-27 | — | — | EP | claimed |
| EP-1623274-A2 | PHOTORESIST COMPOSITIONS | AZ Electronic Materials USA Corp. (US) | 2006-02-08 | — | — | EP | claimed |
| US-20040230084-A1 | Forming ambient pressure and temperature, lightweight, transportable power source; contacting gas with organic compound in pressurized state | KURITA WATER INDUSTRIES LTD. (JP) | 2004-11-18 | — | — | US | claimed |
| WO-2004088423-A2 | PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-10-14 | — | — | WO | claimed |
| US-20040197704-A1 | Photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2004-10-07 | — | — | US | claimed |
| US-6790582-B1 | NOVOLAK RESIN PARTIALLY ESTERIFIED WITH NAPHTHOQUINONEDIAZIDOSULFONYL GROUP; DILUTION RESIN(S), AND SOLVENT | CLARIANT FINANCE BVI LIMITED (VG) | 2004-09-14 | — | — | US | claimed |
| EP-1428831-A1 | METHOD OF STORING HYDROGEN, HYDROGEN INCLUSION COMPOUND AND PROCESS FOR PRODUCING THE SAME | KURITA WATER INDUSTRIES LTD. (JP) | 2004-06-16 | — | — | EP | claimed |
| JP-8193052-A | — | — | None | — | — | JP | disclosed |
| JP-7053427-A | — | — | None | — | — | JP | disclosed |
| US-20250348000-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-13 | — | — | US | disclosed |
| US-20250138420-A1 | ENHANCED EUV PHOTORESISTS AND METHODS OF THEIR USE | IRRESISTIBLE MATERIALS LTD (GB) | 2025-05-01 | — | — | US | disclosed |
| CN-119301526-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2025-01-10 | — | — | CN | disclosed |
| US-12044968-B2 | Protective film-forming composition having acetal structure and amide structure | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-23 | — | — | US | disclosed |
| EP-0739877-A2 | Epoxy resin, resin composition, and resin-encapsulated semiconductor device | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1996-10-30 | — | — | EP | disclosed |
| EP-0459591-B1 | Epoxy resin composition | SHELL INT RESEARCH (NL) | 1996-09-04 | — | — | EP | disclosed |
| JP-H08193052-A | 1,4-BIS(BIS(4-T-BUTOXYCARBONYLMETHYLOXYPHENYL)METHYL) BENZENE AND ITS DERIVATIVE | SHIN ETSU CHEM CO LTD | 1996-07-30 | — | — | JP | disclosed |
| JP-H0753427-A | HOST COMPOUND AND CLATHRATE COMPOUND | NIPPON SODA CO LTD | 1995-02-28 | — | — | JP | disclosed |
| EP-0459591-A2 | Epoxy resin composition | SHELL INTERNATIONALE RESEARCHMAATSCHAPPIJ B.V. (NL) | 1991-12-04 | — | — | EP | disclosed |
| US-5012016-A | Reacting dialdehyde and phenol derivative in presence of acid-functional cationic exchange resin | SHELL OIL COMPANY (US) | 1991-04-30 | — | — | US | disclosed |