⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Dimethylamine SCHEMBL7577153 | 0.94 | — | — | |
| SCHEMBL14699481 | 0.89 | ALDH1A1 (0.34) | — | |
| SCHEMBL2363205 | 0.83 | — | — | |
| SCHEMBL3268667 | 0.83 | ALDH1A1 (0.34) | — | |
| SCHEMBL27845055 | 0.82 | — | — | |
| SCHEMBL8346765 | 0.78 | — | — | |
| SCHEMBL7191321 | 0.77 | — | — | |
| SCHEMBL5084659 | 0.73 | TSHR (0.36) | — | |
| SCHEMBL8602681 | 0.72 | — | — | |
| SCHEMBL2284844 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260022136-A1 | Silicon Compounds And Methods For Depositing Films Using Same | VERSUM MAT US LLC (US) | 2026-01-22 | — | — | US | claimed |
| US-12441747-B2 | Silicon compounds and methods for depositing films using same | VERSUM MATERIALS US, LLC (US) | 2025-10-14 | — | — | US | claimed |
| CN-116288249-B | Silicon compound and method for depositing film using silicon compound | 弗萨姆材料美国有限责任公司 | 2025-05-09 | — | — | CN | claimed |
| EP-4325548-A2 | SILICON COMPOUNDS AND METHODS FOR DEPOSITING FILMS USING SAME | Versum Materials US, LLC (US) | 2024-02-21 | — | — | EP | claimed |
| CN-116288249-A | Silicon compound and method for depositing film using silicon compound | 弗萨姆材料美国有限责任公司 | 2023-06-23 | — | — | CN | claimed |
| US-20230123377-A1 | Silicon Compounds And Methods For Depositing Films Using Same | VERSUM MATERIALS US, LLC | 2023-04-20 | — | — | US | claimed |
| CN-110952074-A | Silicon compound and method for depositing film using the same | 弗萨姆材料美国有限责任公司 | 2020-04-03 | — | — | CN | claimed |
| US-20200048286-A1 | SILICON COMPOUNDS AND METHODS FOR DEPOSITING FILMS USING SAME | VERSUM MAT US LLC (US) | 2020-02-13 | — | — | US | claimed |
| CN-116288249-B | Silicon compound and method for depositing film using silicon compound | 弗萨姆材料美国有限责任公司 | 2025-05-09 | — | — | CN | disclosed |
| EP-4325548-A2 | SILICON COMPOUNDS AND METHODS FOR DEPOSITING FILMS USING SAME | Versum Materials US, LLC (US) | 2024-02-21 | — | — | EP | disclosed |
| CN-116288249-A | Silicon compound and method for depositing film using silicon compound | 弗萨姆材料美国有限责任公司 | 2023-06-23 | — | — | CN | disclosed |
| CN-102027046-B | Organosilicon compound and material for forming silica fine particle | NEC CORP | 2013-05-15 | — | — | CN | disclosed |
| CN-102027047-B | Metal oxide fine particle, method for producing the same, and resin composition | NEC CORP | 2013-02-13 | — | — | CN | disclosed |