SCHEMBL21705263

SCHEMBL21705263

O=C(OCCN1CCNCC1)c1ccc(I)cc1

nearest known ligand 0.56

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.56
MEN1 O00255 2/20 0.56
ATM Q13315 1/20 0.53
CYP2D6 P10635 2/20 0.47
HRH3 Q9Y5N1 1/20 0.46
HPGD P15428 2/20 0.44
KDM4E B2RXH2 1/20 0.44
ALDH1A1 P00352 1/20 0.44
SMN1; SMN2 Q16637 2/20 0.44
SLC29A1 Q99808 1/20 0.44
HRH2 P25021 1/20 0.43
HRH1 P35367 1/20 0.43
GAA P10253 1/20 0.42
CYP1A2 P05177 1/20 0.42
CYP2C9 P11712 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15047632 0.93 KMT2A (0.63) KMT2AMEN1ATMCYP2D6HRH3
SCHEMBL16202965 0.87 KMT2A (0.74) KMT2AMEN1ATMCYP2D6HRH3
SCHEMBL21705256 0.85 KMT2A (0.76) KMT2AMEN1ATMCYP2D6HRH3
SCHEMBL18891134 0.85 MEN1 (0.55) KMT2AMEN1ATMHRH3HPGD
SCHEMBL21705258 0.84 NPSR1 (0.52) KMT2AMEN1ATMHRH3HPGD
SCHEMBL21705701 0.83 KMT2A (0.56) KMT2AMEN1ATMCYP2D6HRH3
SCHEMBL2821475 0.83 ATM (0.77) KMT2AMEN1ATMHPGDKDM4E
SCHEMBL21705703 0.82 KMT2A (0.55) KMT2AMEN1ATMCYP2D6HRH3
Maleic Acid SCHEMBL27397848 0.80 MEN1 (0.49) KMT2AMEN1ATMHRH3HPGD
Maleic Acid SCHEMBL27397850 0.80 MEN1 (0.49) KMT2AMEN1ATMHRH3HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-11187980-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-11-30 US disclosed
US-20200192222-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-06-18 US disclosed
US-20200073237-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-03-05 US disclosed
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-02-13 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS HNRNPU, HNRNPR, ZFR KMT2A 913/4885MEN1 2260/4885ATM 3719/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.