SCHEMBL21705258

SCHEMBL21705258

O=C(OCCN1CCNCC1)c1cccc(I)c1

nearest known ligand 0.52

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
NPSR1 Q6W5P4 1/20 0.52
L3MBTL1 Q9Y468 1/20 0.52
HRH3 Q9Y5N1 2/20 0.48
KDM4E B2RXH2 1/20 0.46
ALDH1A1 P00352 1/20 0.46
MEN1 O00255 2/20 0.45
KMT2A Q03164 2/20 0.45
GAA P10253 1/20 0.44
SMN1; SMN2 Q16637 2/20 0.44
ATM Q13315 1/20 0.43
SLC29A1 Q99808 1/20 0.43
HPGD P15428 1/20 0.41
DRD3 P35462 1/20 0.41
SIGMAR1 Q99720 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21783765 0.87 NPSR1 (0.67) NPSR1L3MBTL1HRH3KDM4EALDH1A1
SCHEMBL21783808 0.85 NPSR1 (0.52) NPSR1L3MBTL1HRH3KDM4EMEN1
SCHEMBL21705702 0.85 NPSR1 (0.52) NPSR1L3MBTL1HRH3KDM4EMEN1
SCHEMBL21705261 0.85 L3MBTL1 (0.72) NPSR1L3MBTL1HRH3KDM4EALDH1A1
SCHEMBL21705263 0.84 KMT2A (0.56) HRH3KDM4EALDH1A1MEN1KMT2A
SCHEMBL18891134 0.84 MEN1 (0.55) NPSR1L3MBTL1HRH3KDM4EALDH1A1
SCHEMBL15047632 0.82 KMT2A (0.63) NPSR1L3MBTL1HRH3KDM4EALDH1A1
Maleic Acid SCHEMBL27397848 0.78 MEN1 (0.49) NPSR1L3MBTL1HRH3KDM4EALDH1A1
Maleic Acid SCHEMBL27397850 0.78 MEN1 (0.49) NPSR1L3MBTL1HRH3KDM4EALDH1A1
SCHEMBL16202965 0.77 KMT2A (0.74) NPSR1HRH3KDM4EALDH1A1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-11187980-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-11-30 US disclosed
US-20200192222-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-06-18 US disclosed
US-20200073237-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-03-05 US disclosed
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-02-13 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS HNRNPU, HNRNPR, ZFR NPSR1 1301/4885L3MBTL1 1874/4885HRH3 622/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.