Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.61 |
| ▸ | CYP2D6 | P10635 | 4/20 | 0.61 |
| ▸ | HRH3 | Q9Y5N1 | 3/20 | 0.61 |
| ▸ | MAOA | P21397 | 2/20 | 0.61 |
| ▸ | HTR3A | P46098 | 1/20 | 0.61 |
| ▸ | BLM | P54132 | 1/20 | 0.59 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.59 |
| ▸ | SCN1A | P35498 | 5/20 | 0.58 |
| ▸ | SCN2A | Q99250 | 5/20 | 0.58 |
| ▸ | SCN3A | Q9NY46 | 5/20 | 0.58 |
| ▸ | LMNA | P02545 | 3/20 | 0.58 |
| ▸ | ATM | Q13315 | 1/20 | 0.54 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.54 |
| ▸ | CYP1A2 | P05177 | 3/20 | 0.47 |
| ▸ | KCNH2 | Q12809 | 3/20 | 0.47 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.47 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.47 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.47 |
| ▸ | MEN1 | O00255 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21705613 | 0.91 | CYP2D6 (0.51) | TSHRCYP2D6HRH3MAOAHTR3A | |
| SCHEMBL21705606 | 0.91 | TSHR (0.72) | TSHRCYP2D6HRH3MAOAHTR3A | |
| SCHEMBL21705607 | 0.84 | TSHR (0.61) | TSHRCYP2D6HRH3MAOAHTR3A | |
| SCHEMBL26807523 | 0.82 | PHLPP2 (0.51) | TSHRCYP2D6HRH3MAOAHTR3A | |
| SCHEMBL26807513 | 0.81 | TSHR (0.54) | TSHRCYP2D6HRH3MAOAHTR3A | |
| SCHEMBL26809402 | 0.81 | TSHR (0.54) | TSHRCYP2D6HRH3MAOAHTR3A | |
| SCHEMBL26809424 | 0.81 | PHLPP2 (0.45) | TSHRCYP2D6HRH3MAOAHTR3A | |
| SCHEMBL25239695 | 0.79 | CYP2D6 (0.94) | TSHRCYP2D6HRH3MAOAHTR3A | |
| SCHEMBL34468111 | 0.79 | PHLPP2 (0.71) | TSHRCYP2D6HRH3MAOAHTR3A | |
| SCHEMBL26807545 | 0.79 | PHLPP2 (0.57) | TSHRCYP2D6HRH3MAOAHTR3A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11835859-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| US-11774853-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-03 | — | — | US | disclosed |
| US-11774853-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-03 | — | — | US | disclosed |
| US-20230129578-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20230129578-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-11187980-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-11-30 | — | — | US | disclosed |
| US-20200192222-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-06-18 | — | — | US | disclosed |
| US-20200073237-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-03-05 | — | — | US | disclosed |
| US-20200050105-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-02-13 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20200050105-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | HNRNPU, HNRNPR, ZFR | TSHR 969/4885CYP2D6 3435/4885HRH3 622/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.