SCHEMBL21705613

SCHEMBL21705613

O=C(OCCN(CCO)CCO)c1ccc(I)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CYP2D6 P10635 3/20 0.51
▸ TSHR P16473 3/20 0.51
▸ MAOA P21397 2/20 0.51
▸ HRH3 Q9Y5N1 2/20 0.51
▸ HTR3A P46098 1/20 0.51
▸ BLM P54132 1/20 0.50
▸ NPSR1 Q6W5P4 1/20 0.50
▸ LMNA P02545 3/20 0.49
▸ SCN1A P35498 3/20 0.49
▸ SCN2A Q99250 3/20 0.49
▸ SCN3A Q9NY46 3/20 0.49
▸ PHLPP2 Q6ZVD8 1/20 0.46
▸ ATM Q13315 1/20 0.46
▸ L3MBTL1 Q9Y468 1/20 0.46
▸ GAA P10253 2/20 0.44
▸ CYP1A2 P05177 2/20 0.44
▸ CYP3A4 P08684 2/20 0.44
▸ KCNH2 Q12809 2/20 0.44
▸ CHRM2 P08172 1/20 0.44
▸ HTR1A P08908 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21705598 0.91 TSHR (0.61) CYP2D6TSHRMAOAHRH3HTR3A
SCHEMBL26809424 0.86 PHLPP2 (0.45) CYP2D6TSHRMAOAHRH3HTR3A
SCHEMBL26807523 0.84 PHLPP2 (0.51) CYP2D6TSHRMAOAHRH3HTR3A
SCHEMBL21705606 0.84 TSHR (0.72) CYP2D6TSHRMAOAHRH3HTR3A
SCHEMBL21705611 0.82 TSHR (0.52) CYP2D6TSHRMAOAHRH3HTR3A
SCHEMBL26809605 0.81 PHLPP2 (0.50) CYP2D6TSHRMAOAHRH3HTR3A
SCHEMBL12661910 0.81 ALDH1A1 (0.52) CYP2D6TSHRMAOAHRH3HTR3A
SCHEMBL34468111 0.80 PHLPP2 (0.71) CYP2D6TSHRMAOAHRH3HTR3A
SCHEMBL26807545 0.80 PHLPP2 (0.57) CYP2D6TSHRMAOAHRH3HTR3A
SCHEMBL13291855 0.78 TDP1 (0.56) CYP2D6TSHRLMNAGAACYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 — — US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 — — US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 — — US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 — — US disclosed
US-11187980-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-11-30 — — US disclosed
US-20200192222-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-06-18 — — US disclosed
US-20200073237-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-03-05 — — US disclosed
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-02-13 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS HNRNPU, HNRNPR, ZFR CYP2D6 3435/4885TSHR 969/4885MAOA 1740/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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