Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES1 | P23141 | 2/20 | 0.48 |
| ▸ | CES2 | O00748 | 1/20 | 0.48 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.43 |
| ▸ | PAM | P19021 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 3/20 | 0.42 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.41 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.41 |
| ▸ | FNTA | P49354 | 1/20 | 0.40 |
| ▸ | FNTB | P49356 | 1/20 | 0.40 |
| ▸ | CALM1 | P0DP23 | 1/20 | 0.39 |
| ▸ | CTBP2 | P56545 | 1/20 | 0.39 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14775421 | 0.87 | CES1 (0.52) | CES1CES2AKR1B1ALDH1A1MAPK1 | |
| SCHEMBL14775420 | 0.87 | CES1 (0.52) | CES1CES2AKR1B1ALDH1A1MAPK1 | |
| SCHEMBL8046342 | 0.83 | ALDH1A1 (0.50) | CES1CES2AKR1B1ALDH1A1MAPK1 | |
| SCHEMBL6551294 | 0.82 | TDP1 (0.52) | CES1CES2AKR1B1ALDH1A1MAPK1 | |
| SCHEMBL13176469 | 0.81 | ALDH1A1 (0.44) | CES1CES2AKR1B1ALDH1A1MAPK1 | |
| SCHEMBL16966556 | 0.80 | CES1 (0.45) | CES1CES2AKR1B1ALDH1A1MAPK1 | |
| SCHEMBL7403189 | 0.79 | ALDH1A1 (0.59) | CES1CES2AKR1B1ALDH1A1MAPK1 | |
| SCHEMBL303863 | 0.79 | ALDH1A1 (0.44) | CES1CES2AKR1B1ALDH1A1MAPK1 | |
| SCHEMBL28079753 | 0.78 | ALDH1A1 (0.44) | CES1CES2AKR1B1ALDH1A1MAPK1 | |
| SCHEMBL28106832 | 0.78 | CES1 (0.41) | CES1CES2AKR1B1ALDH1A1MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 246 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112625553-B | Latent self-curing resin coating composition and construction method thereof | 陕西科技大学 | 2022-02-01 | — | — | CN | claimed |
| EP-1930310-B1 | PROCESS FOR PRODUCING 3,3,3-TRIFLUOROPROPIONALDEHYDE | CENTRAL GLASS CO LTD (JP) | 2011-11-16 | — | — | EP | claimed |
| US-20110263941-A1 | ENDOSCOPE DESIGNS AND METHODS OF MANUFACTURE | Intergrated Endoscopy,Inc. (US) | 2011-10-27 | — | — | US | claimed |
| EP-1950191-B1 | PROCESS FOR PRODUCING 3,3,3-TRIFLUOROPROPIONIC ACID | CENTRAL GLASS CO LTD (JP) | 2011-10-19 | — | — | EP | claimed |
| EP-1654295-B1 | COPOLYMERS COMPRISING BRANCHED OLEFIN AND VINYL ETHER UNITS | SCIMED LIFE SYSTEMS INC (US) | 2009-01-14 | — | — | EP | claimed |
| US-6951705-B2 | Polymers for photoresist compositions for microlithography | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2005-10-04 | — | — | US | claimed |
| US-20030211417-A1 | Polymers for photoresist compositions for microlithography | DUPONT ELECTRONICS, INC. | 2003-11-13 | — | — | US | claimed |
| EP-1279069-A2 | POLYMERS FOR PHOTORESIST COMPOSITIONS FOR MICROLITHOGRAPHY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2003-01-29 | — | — | EP | claimed |
| WO-2001086352-A2 | POLYMERS FOR PHOTORESIST COMPOSITIONS FOR MICROLITHOGRAPHY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2001-11-15 | — | — | WO | claimed |
| US-12497530-B2 | Active energy ray polymerization initiator, active energy ray curing composition, active energy ray curing ink, aqueous active energy ray curing ink, container, image forming device, image forming method, and method of manufacturing active energy ray polymerization initiator | RICOH COMPANY, LTD. (JP) | 2025-12-16 | — | — | US | disclosed |
| EP-4632111-A2 | PROCESS FOR THE PREPARATION OF ACETALS OF ALPHA-CHLORO- OR ALPHA-BROMO-ALDEHYDES | ESy-Labs-GmbH (DE) | 2025-10-15 | — | — | EP | disclosed |
| EP-4632110-A1 | PROCESS FOR THE HALOGENATION OF ORGANIC COMPOUNDS | ESy-Labs-GmbH (DE) | 2025-10-15 | — | — | EP | disclosed |
| US-12410333-B2 | Inkjet ink | NORITAKE CO., LIMITED (JP) | 2025-09-09 | — | — | US | disclosed |
| US-12122860-B2 | Photocurable support material composition for inkjet 3D printers, ink for inkjet 3D printers, cartridge for inkjet 3D printers, method for producing support material and method for producing optically shaped article | NIPPON SHOKUBAI CO., LTD. (JP) | 2024-10-22 | — | — | US | disclosed |
| WO-1996037529-A1 | HOMOPOLYMERS AND COPOLYMERS OF CATIONICALLY POLYMERIZABLE MONOMERS AND METHOD OF THEIR PREPARATION | THE B.F. GOODRICH COMPANY (US) | 1996-11-28 | — | — | WO | disclosed |
| EP-0033081-B1 | ANIONIC COPOLYMERS CONTAINING POLYVALENT METAL CATIONS AND THEIR USE IN PHOTOGRAPHIC MATERIALS | Agfa-Gevaert AG (DE) | 1985-04-24 | — | — | EP | disclosed |
| EP-0048412-B1 | PHOTOGRAPHIC MATERIAL WITH A TEMPORARY BARRIER LAYER | Agfa-Gevaert AG (DE) | 1984-06-20 | — | — | EP | disclosed |
| US-4426438-A | Anionic copolymers containing polyvalent metal cations and their use in photographic materials | AGFA-GEVAERT AKTIENGESELLSCHAFT (DE) | 1984-01-17 | — | — | US | disclosed |
| EP-0048412-A1 | Photographic material with a temporary barrier layer | Agfa-Gevaert AG (DE) | 1982-03-31 | — | — | EP | disclosed |
| EP-0033081-A1 | Anionic copolymers containing polyvalent metal cations and their use in photographic materials | Agfa-Gevaert AG (DE) | 1981-08-05 | — | — | EP | disclosed |