Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NOS2 | P35228 | 1/20 | 0.38 |
| ▸ | HPGD | P15428 | 7/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | POLB | P06746 | 4/20 | 0.33 |
| ▸ | TP53 | P04637 | 2/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | RECQL | P46063 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL156420 | 0.94 | NOS2 (0.43) | NOS2HPGDALDH1A1GAAPOLB | |
| SCHEMBL4302730 | 0.87 | — | — | |
| SCHEMBL10619156 | 0.82 | HPGD (0.37) | NOS2HPGDALDH1A1GAAPOLB | |
| SCHEMBL9305499 | 0.78 | — | — | |
| SCHEMBL7381082 | 0.78 | NOS2 (0.43) | NOS2HPGDALDH1A1GAAPOLB | |
| SCHEMBL8086969 | 0.78 | — | — | |
| SCHEMBL15877835 | 0.78 | NOS2 (0.43) | NOS2HPGDALDH1A1GAAPOLB | |
| SCHEMBL353811 | 0.78 | — | — | |
| SCHEMBL5026802 | 0.78 | NOS2 (0.43) | NOS2HPGDALDH1A1GAAPOLB | |
| SCHEMBL26781597 | 0.78 | NOS2 (0.43) | NOS2HPGDALDH1A1GAAPOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3847220-B1 | UV-CURABLE HOT MELT ADHESIVE COMPOSITIONS FOR FLOORING APPLICATIONS | BASF SE (DE) | 2025-03-05 | — | — | EP | claimed |
| EP-3368593-B1 | IMPROVED BINDER COMPOSITIONS AND USES THEREOF | KNAUF INSULATION SPRL (BE) | 2023-12-06 | — | — | EP | claimed |
| EP-3204444-B1 | PHOSPHATE ESTER-MODIFIED ACRYLIC POLYOLS | BASF SE (DE) | 2023-08-30 | — | — | EP | claimed |
| EP-1841803-B1 | THERMALLY CURABLE RESIN COMPOSITION WITH EXTENDED STORAGE STABILITY AND GOOD ADHESIVE PROPERTY | LG CHEMICAL LTD (KR) | 2009-07-22 | — | — | EP | claimed |
| EP-0451736-B1 | Aqueous processable photosensitive element | DU PONT (US) | 1997-07-09 | — | — | EP | claimed |
| EP-0524187-B1 | POSITIVE WORKING RESIST COMPOSITIONS AND THEIR UTILITY IN DRY FILM PHOTORESISTS | DU PONT (US) | 1996-07-10 | — | — | EP | claimed |
| US-5093221-A | Photosolubilizable layer containing acid-labile polymer and photosolubilizer | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-03-03 | — | — | US | claimed |
| US-5071731-A | A photosolubilizable layer, an acid-labile polymer, an elastomeric layer and a support; improved image reproduction | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-12-10 | — | — | US | claimed |
| EP-0451736-A2 | Aqueous processable photosensitive element | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-10-16 | — | — | EP | claimed |
| US-20250206862-A1 | CAVITY FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-06-26 | — | — | US | disclosed |
| US-20250136734-A1 | PROTECTIVE-FILM FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-05-01 | — | — | US | disclosed |
| WO-2023182195-A1 | COMPOSITION FOR FORMING CAVITY | 日産化学株式会社 | 2023-09-28 | — | — | WO | disclosed |
| WO-2023157772-A1 | PROTECTIVE FILM FORMING COMPOSITION | 日産化学株式会社 | 2023-08-24 | — | — | WO | disclosed |
| US-20230250229-A1 | IODO-FUNCTIONALIZED POLYMERS AS MASS SPECTROMETRY CALIBRANTS WITH A MASS-DEFECT OFFSET | POLYMER FACTORY SWEDEN AB (SE) | 2023-08-10 | — | — | US | disclosed |
| EP-0505972-A2 | Process for producing styrenic copolymer | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1992-09-30 | — | — | EP | disclosed |
| US-5093221-A | Photosolubilizable layer containing acid-labile polymer and photosolubilizer | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-03-03 | — | — | US | disclosed |
| US-5071731-A | A photosolubilizable layer, an acid-labile polymer, an elastomeric layer and a support; improved image reproduction | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-12-10 | — | — | US | disclosed |
| EP-0451735-A2 | Improved elastomeric layer for multilayer tonable photosensitive elements | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-10-16 | — | — | EP | disclosed |
| EP-0451736-A2 | Aqueous processable photosensitive element | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-10-16 | — | — | EP | disclosed |
| EP-0032124-A2 | Process for producing a crosslinked polymerizate for dental purposes | DENTSPLY INTERNATIONAL, INC. (US) | 1981-07-15 | — | — | EP | disclosed |