⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15963 | 0.76 | ALDH1A1 (0.61) | — | |
| SCHEMBL2215339 | 0.76 | ALDH1A1 (0.61) | — | |
| SCHEMBL573944 | 0.73 | — | — | |
| SCHEMBL31589203 | 0.73 | ALDH1A1 (0.58) | — | |
| SCHEMBL31462280 | 0.73 | ALDH1A1 (0.58) | — | |
| Hydrochloric Acid SCHEMBL17099626 | 0.73 | ALDH1A1 (0.58) | — | |
| SCHEMBL1849 | 0.73 | — | — | |
| SCHEMBL31415277 | 0.73 | ALDH1A1 (0.58) | — | |
| SCHEMBL8953021 | 0.73 | ALDH1A1 (0.58) | — | |
| SCHEMBL10636466 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2561 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118234766-A | Polymer compound and use thereof | 株式会社三养社 | 2024-06-21 | — | — | CN | claimed |
| EP-4368658-A1 | ORGANOPOLYSILOXANE AND PRODUCTION METHOD THEREFOR | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-05-15 | — | — | EP | claimed |
| WO-2024070902-A1 | COMPOUND, METHOD FOR PRODUCING SAID COMPOUND, CURABLE MATERIAL, CURABLE COMPOSITION, METHOD FOR PRODUCING CURED ARTICLE, AND CURED ARTICLE | 株式会社ADEKA | 2024-04-04 | — | — | WO | claimed |
| US-11795270-B2 | Triazine ring-containing polymer and film forming composition containing same | NISSAN CHEMICAL CORPORATION (JP) | 2023-10-24 | — | — | US | claimed |
| CN-112321632-B | Silane copolymer for aqueous system and preparation method thereof | 湖北新蓝天新材料股份有限公司 | 2023-10-03 | — | — | CN | claimed |
| US-11771172-B2 | Shoe-forming member and shoe | ASICS CORPORATION (JP) | 2023-10-03 | — | — | US | claimed |
| WO-2023182309-A1 | COMPOUND, POLYMER, COMPOSITION, RUST-PREVENTIVE AGENT, ADHESIVE AGENT, AND COATING AGENT | 三井化学株式会社 | 2023-09-28 | — | — | WO | claimed |
| CN-116589626-A | Special heat-resistant modifier for PVC material and preparation method thereof | 威海金合思化工有限公司 | 2023-08-15 | — | — | CN | claimed |
| CN-116444373-A | Norrish II type photoinitiator and application thereof in dental materials | 杭州师范大学 | 2023-07-18 | — | — | CN | claimed |
| WO-2023121292-A1 | POLYMER COMPOUND AND APPLICATION THEREOF | 주식회사 삼양사 | 2023-06-29 | — | — | WO | claimed |
| US-5320784-A | Crystal comprising an indolinospirobenzothiopyran derivative and its ring opened isomer | OTSUKA KAGAKU KABUSHIKI KAISHA (JP) | 1994-06-14 | — | — | US | claimed |
| US-5288592-A | Transition metal-spirobenzopyran complex, a production process therefor and a photochromic material comprising the complex | OTSUKA KAGAKU KABUSHIKI KAISHA (JP) | 1994-02-22 | — | — | US | claimed |
| EP-0530369-A1 | CRYSTAL COMPRISING INDOLINOSPIROBENZOTHIOPYRAN DERIVATIVE AND RING-OPENING ISOMER THEREOF | OTSUKA KAGAKU KABUSHIKI KAISHA (JP) | 1993-03-10 | — | — | EP | claimed |
| EP-0530371-A1 | TRANSITION METAL-SPIROBENZOPYRAN COMPLEX, PRODUCTION THEREOF, AND PHOTOCHROMIC MATERIAL COMPRISING THE SAME | OTSUKA KAGAKU KABUSHIKI KAISHA (JP) | 1993-03-10 | — | — | EP | claimed |
| EP-0529100-A1 | INDOLINOSPIROBENZOPYRAN DERIVATIVE | OTSUKA KAGAKU KABUSHIKI KAISHA (JP) | 1993-03-03 | — | — | EP | claimed |
| EP-0262255-B1 | ACRYLOXYMETHYL SUBSTITUTED FATTY COMPOUNDS | HENKEL CORPORATION (a Delaware corp.) (US) | 1991-08-28 | — | — | EP | claimed |
| EP-0164598-B1 | PHOTOSENSITIVE RESIN COMPOSITION AND PROCESS FOR FORMING PHOTO-RESIST PATTERN USING THE SAME | NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) | 1990-09-12 | — | — | EP | claimed |
| US-4900582-A | EXPOSURE TO ULTRAVIOLET RADIATION IN ZONE ATMOSPHERE | TOKYO OHKA KOGYO CO., LTD. (JP) | 1990-02-13 | — | — | US | claimed |
| US-4702990-A | Photosensitive resin composition and process for forming photo-resist pattern using the same | NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) | 1987-10-27 | — | — | US | claimed |
| EP-0164598-A2 | Photosensitive resin composition and process for forming photo-resist pattern using the same | NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) | 1985-12-18 | — | — | EP | claimed |