SCHEMBL2172018

SCHEMBL2172018

[CH2]COC(OCC)(OCC)C(OC=C)(OCC)OC(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2172013 1.00
SCHEMBL896107 0.71
SCHEMBL2170771 0.70
SCHEMBL2170880 0.70
SCHEMBL2170883 0.67
SCHEMBL17133769 0.66
SCHEMBL896542 0.66
SCHEMBL895708 0.63
SCHEMBL896086 0.62
SCHEMBL7484712 0.62 ALDH1A1 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2348081-B1 ADHESIVE COMPOSITION AND OPTICAL MEMBER CHEIL IND INC (KR) 2017-03-01 EP disclosed
EP-2348081-A1 ADHESIVE COMPOSITION AND OPTICAL MEMBER Cheil Industries Inc. (KR) 2011-07-27 EP disclosed
EP-1308434-B1 (Meth)acryloyl group-containing compound and method for producing the same NIPPON CATALYTIC CHEM IND (JP) 2006-03-15 EP disclosed
US-6887946-B2 (Meth) acryloyl group-containing compound and method for producing the same NIPPON SHOKUBAI CO., LTD. (JP) 2005-05-03 US disclosed
US-20030134926-A1 (Meth) acryloyl group-containing compound and method for producing the same NIPPON SHOKUBAI CO., LTD. 2003-07-17 US disclosed
EP-1308434-A1 (Meth)acryloyl group-containing compound and method for producing the same Nippon Shokubai Co., Ltd. (JP) 2003-05-07 EP disclosed