Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4585035 | 0.96 | MEN1 (0.39) | MEN1KMT2ATSHRMAPK1 | |
| Ethane SCHEMBL6012215 | 0.90 | MEN1 (0.35) | MEN1KMT2ATSHRMAPK1 | |
| SCHEMBL525531 | 0.88 | — | — | |
| Propane SCHEMBL10740306 | 0.87 | ALDH1A1 (0.35) | MEN1KMT2ATSHR | |
| SCHEMBL16644302 | 0.87 | — | — | |
| SCHEMBL17058732 | 0.86 | — | — | |
| SCHEMBL16644299 | 0.85 | — | — | |
| SCHEMBL2627762 | 0.85 | — | — | |
| SCHEMBL7417739 | 0.85 | ALDH1A1 (0.52) | MEN1KMT2ATSHR | |
| SCHEMBL31425250 | 0.84 | TSHR (0.31) | TSHRMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 66 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2021149542-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN COATING, PHOTOSENSITIVE DRY FILM, PATTERN FORMATION METHOD | 信越化学工業株式会社 | 2021-07-29 | — | — | WO | disclosed |
| WO-2020209327-A1 | CHEMICAL-RESISTANT PROTECTIVE FILM FORMING COMPOSITION CONTAINING HYDROXYARYL-TERMINATED POLYMER | 日産化学株式会社 | 2020-10-15 | — | — | WO | disclosed |
| WO-2020189712-A1 | FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FORMING FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD, AND PURIFICATION METHOD | 三菱瓦斯化学株式会社 | 2020-09-24 | — | — | WO | disclosed |
| EP-2185976-B1 | PHOTOSENSITIVE COMPOSITIONS CONTAINING POLYVINYL ALCOHOL AND THEIR USE IN PRINTING PROCESSES | KIIAN S P A SOCIO UNICO (IT) | 2013-04-24 | — | — | EP | disclosed |
| EP-1788436-B1 | Rework process for photoresist film | SHINETSU CHEMICAL CO (JP) | 2013-01-09 | — | — | EP | disclosed |
| EP-1813985-B1 | Antireflection film composition, substrate, and pattering process | SHINETSU CHEMICAL CO (JP) | 2012-10-31 | — | — | EP | disclosed |
| US-8288072-B2 | Antireflection film; fast etching speed whcih reduces deformation; accuracy; 2,3-epoxypropyl methacrylate ester-styrene copolymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-10-16 | — | — | US | disclosed |
| US-8216749-B2 | Curable composition, negative type color filter and method of producing the same | FUJIFILM CORPORATION (JP) | 2012-07-10 | — | — | US | disclosed |
| US-8088554-B2 | Bottom resist layer composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2012-01-03 | — | — | US | disclosed |
| US-7868407-B2 | Substrate comprising a lower silicone resin film and an upper silicone resin film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-01-11 | — | — | US | disclosed |
| US-6672210-B2 | Lithographic printing plate precursor with a graft polymerized hydrophilic layer | FUJI PHOTO FILM CO., LTD. (JP) | 2004-01-06 | — | — | US | disclosed |
| EP-0839856-B1 | Polyester film for decorative plate or decorative sheet | MITSUBISHI POLYESTER FILM CORP (JP) | 2003-12-17 | — | — | EP | disclosed |
| US-20030172828-A1 | Regenerative plate making and printing process, and plate making and printing apparatus | MITSUBISHI HEAVY INDUSTRIES PRINTING & PACKAGING MACHINERY, LTD. (JP) | 2003-09-18 | — | — | US | disclosed |
| EP-1287986-A1 | METHOD AND DEVICE FOR REGENERATIVE PROCESSING AND PRINTING | MITSUBISHI CHEMICAL CORPORATION (JP) | 2003-03-05 | — | — | EP | disclosed |
| US-20020023565-A1 | Lithographic printing plate precursor | FUJIFILM CORPORATION (JP) | 2002-02-28 | — | — | US | disclosed |
| EP-1172696-A1 | Lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD (JP) | 2002-01-16 | — | — | EP | disclosed |
| EP-1057852-A2 | Polyester film for decorative plate or decorative sheet | Mitsubishi Polyester Film Corporation (JP) | 2000-12-06 | — | — | EP | disclosed |
| US-6096410-A | POLYESTER FILM FOR DECORATIVE PLATE OR HAS OPTICAL DENSITY OF 0.1 TO 5.0, A B VALUE OF NOT LESS THAN-0.5 AND LONGITUDINAL AND TRANSVERSE HEAT SHRINKAGE PERCENTAGES OF NOT LESS THAN -10.0% AND NOT MORE THAN +10.0% AFTER HEAT TREATMENT | MITSUBISHI POLYESTER FILM CORPORATION (JP) | 2000-08-01 | — | — | US | disclosed |
| US-5932320-A | Polyester film for decorative plate or decorative sheet | MITSUBISHI POLYESTER FILM CORPORATION (JP) | 1999-08-03 | — | — | US | disclosed |
| EP-0839856-A2 | Polyester film for decorative plate or decorative sheet | Mitsubishi Polyester Film Corporation (JP) | 1998-05-06 | — | — | EP | disclosed |