SCHEMBL21755802

SCHEMBL21755802

C=CCOc1ccc(-c2ccc(OCC=C)c(C(c3cc(-c4ccc(OCC=C)cc4)ccc3OCC=C)c3cc(I)cc(I)c3OCC=C)c2)cc1

nearest known ligand 0.36

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
MGAM O43451 3/20 0.36
GAA P10253 3/20 0.36
SI P14410 3/20 0.36
MGAM2 Q2M2H8 3/20 0.36
MAOB P27338 6/20 0.32
MAOA P21397 3/20 0.32
KDM4E B2RXH2 1/20 0.32
ALDH1A1 P00352 1/20 0.32
MAPT P10636 1/20 0.32
MAPK1 P28482 1/20 0.32
CA12 O43570 1/20 0.32
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
CA7 P43166 1/20 0.32
CA9 Q16790 1/20 0.32
CYP2D6 P10635 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21755792 0.89 MAOB (0.35) MGAMGAASIMGAM2MAOB
SCHEMBL23960153 0.85 MAOB (0.37) MGAMGAASIMGAM2MAOB
SCHEMBL23587192 0.84 MAOB (0.31) MAOB
SCHEMBL23587434 0.82 MAOB (0.31) MGAMGAASIMGAM2MAOB
SCHEMBL23960140 0.82 MAOB (0.31) MGAMGAASIMGAM2MAOB
SCHEMBL21755786 0.80 CYP3A4 (0.35) MGAMGAASIMGAM2ALDH1A1
SCHEMBL23587456 0.80 GAA (0.38) MGAMGAASIMGAM2MAOB
SCHEMBL20198498 0.79 MEN1 (0.39) MGAMGAASIMGAM2MAOB
SCHEMBL20198556 0.79 MEN1 (0.39) MGAMGAASIMGAM2MAOB
SCHEMBL21755807 0.79 APP (0.35) MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210331994-A1 COMPOUND, COMPOSITION CONTAINING THE SAME, METHOD FOR FORMING RESIST PATTERN AND METHOD FOR FORMING INSULATING FILM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-10-28 US disclosed
EP-3842491-A1 COMPOUND, COMPOSITION CONTAINING THE SAME, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING INSULATING FILM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-06-30 EP disclosed
WO-2020040162-A1 COMPOUND, COMPOSITION CONTAINING SAME, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING INSULATING FILM 三菱瓦斯化学株式会社 2020-02-27 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210331994-A1 COMPOUND, COMPOSITION CONTAINING THE SAME, METHOD FOR FORMING RESIST PATTERN AND METHOD FOR FORMING INSULATING FILM BMI1, PRDM9, CTCF MGAM 1801/4885GAA 3071/4885SI 3257/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.