SCHEMBL23587192

SCHEMBL23587192

C#CCCOc1ccc(-c2ccc(OCC#C)c(C(c3cc(-c4ccc(OCC=C)cc4)ccc3OCC#C)c3cc(I)cc(I)c3OCC#C)c2)cc1

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
MAOB P27338 3/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21755792 0.91 MAOB (0.35) MAOB
SCHEMBL23960153 0.88 MAOB (0.37) MAOB
SCHEMBL23587434 0.87 MAOB (0.31) MAOB
SCHEMBL23960140 0.85 MAOB (0.31) MAOB
SCHEMBL21755802 0.84 MGAM (0.36) MAOB
SCHEMBL21755786 0.74 CYP3A4 (0.35)
SCHEMBL21755789 0.70
SCHEMBL21755807 0.69 APP (0.35)
SCHEMBL21755787 0.68 APP (0.35)
SCHEMBL23085018 0.68 MAOB (0.39) MAOB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3842491-A1 COMPOUND, COMPOSITION CONTAINING THE SAME, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING INSULATING FILM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-06-30 EP disclosed