SCHEMBL21799995

SCHEMBL21799995

CC(C)C(C)CNc1cccc(N)c1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 3/20 0.44
MEN1 O00255 2/20 0.44
GAA P10253 2/20 0.44
KMT2A Q03164 2/20 0.44
KDM4E B2RXH2 1/20 0.44
LMNA P02545 1/20 0.44
GFER P55789 1/20 0.44
TDP1 Q9NUW8 1/20 0.44
ALDH1A1 P00352 3/20 0.43
DDX3X O00571 2/20 0.42
RAPGEF4 Q8WZA2 1/20 0.41
HDAC3 O15379 1/20 0.40
HDAC4 P56524 1/20 0.40
HDAC1 Q13547 1/20 0.40
HDAC7 Q8WUI4 1/20 0.40
HDAC2 Q92769 1/20 0.40
HDAC10 Q969S8 1/20 0.40
HDAC11 Q96DB2 1/20 0.40
HDAC8 Q9BY41 1/20 0.40
HDAC6 Q9UBN7 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29922614 1.00 MAPT (0.44) MAPTMEN1GAAKMT2AKDM4E
SCHEMBL15516467 0.85 MAPT (0.47) MAPTMEN1GAAKMT2AKDM4E
SCHEMBL29922436 0.85 MAPT (0.47) MAPTMEN1GAAKMT2AKDM4E
SCHEMBL7174664 0.82 ALDH1A1 (0.47) MAPTMEN1GAAKMT2AKDM4E
SCHEMBL21799972 0.81 MAPT (0.43) MAPTMEN1GAAKMT2AKDM4E
SCHEMBL6945904 0.81 MAPT (0.43) MAPTMEN1GAAKMT2AKDM4E
Hydrochloric Acid SCHEMBL6937940 0.79 MAPT (0.42) MAPTMEN1GAAKMT2AKDM4E
SCHEMBL21799640 0.79 MAPT (0.44) MAPTMEN1GAAKMT2AKDM4E
SCHEMBL29922565 0.79 MAPT (0.44) MAPTMEN1GAAKMT2AKDM4E
SCHEMBL21799966 0.78 MEN1 (0.41) MAPTMEN1GAAKMT2AKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3623398-B1 RESIN COMPOSITION COMPRISING A MODIFIED BLOCK COPOLYMER AND METHOD FOR PRODUCING MODIFIED BLOCK COPOLYMER ASAHI CHEMICAL IND (JP) 2024-08-28 EP disclosed
CN-110603273-B Modified block copolymer, method for producing modified block copolymer, and resin composition 旭化成株式会社 2022-10-14 CN disclosed
US-11124593-B2 Modified block copolymer, method for producing modified block copolymer, and resin composition ASAHI KASEI KABUSHIKI KAISHA (JP) 2021-09-21 US disclosed
US-20200199282-A1 Modified Block Copolymer, Method for Producing Modified Block Copolymer, and Resin Composition ASAHI KASEI KABUSHIKI KAISHA (JP) 2020-06-25 US disclosed
EP-3623398-A1 MODIFIED BLOCK COPOLYMER, METHOD FOR PRODUCING MODIFIED BLOCK COPOLYMER, AND RESIN COMPOSITION Asahi Kasei Kabushiki Kaisha (JP) 2020-03-18 EP disclosed
CN-110603273-A Modified block copolymer, method for producing modified block copolymer, and resin composition 旭化成株式会社 2019-12-20 CN disclosed