SCHEMBL21829149

SCHEMBL21829149

c1ccc2c(c1)-c1ccccc1C2(c1ccc(-c2ccc(OCCOCC3CO3)cc2)cc1)c1ccc(-c2ccc(OCCOCC3CO3)cc2)cc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.41
MEN1 O00255 3/20 0.37
KMT2A Q03164 3/20 0.37
MAPT P10636 4/20 0.36
SMN1; SMN2 Q16637 4/20 0.36
LMNA P02545 2/20 0.36
KDM4E B2RXH2 1/20 0.36
OPRK1 P41145 1/20 0.36
ALDH1A1 P00352 5/20 0.35
TSHR P16473 4/20 0.35
TP53 P04637 4/20 0.35
HIF1A Q16665 2/20 0.35
CYP3A4 P08684 1/20 0.35
HPGD P15428 2/20 0.35
CYP1A2 P05177 1/20 0.35
PPARG P37231 1/20 0.35
GAA P10253 1/20 0.35
PKM P14618 1/20 0.35
GLA P06280 1/20 0.33
PDK2 Q15119 3/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29420739 0.96 TDP1 (0.44) TDP1MEN1KMT2AMAPTSMN1; SMN2
SCHEMBL193740 0.96 TDP1 (0.44) TDP1MEN1KMT2AMAPTSMN1; SMN2
SCHEMBL16172297 0.92 TDP1 (0.40) TDP1MEN1KMT2AMAPTSMN1; SMN2
SCHEMBL20492222 0.90 TDP1 (0.43) TDP1MEN1KMT2AMAPTSMN1; SMN2
SCHEMBL15966166 0.89 TDP1 (0.54) TDP1MEN1KMT2AMAPTSMN1; SMN2
SCHEMBL16903533 0.89 TDP1 (0.38) TDP1MEN1KMT2AMAPTSMN1; SMN2
SCHEMBL4211985 0.88 PDK2 (0.42) TDP1MEN1KMT2AMAPTSMN1; SMN2
SCHEMBL22493973 0.88 TDP1 (0.37) TDP1MEN1KMT2AMAPTSMN1; SMN2
SCHEMBL19445205 0.88 TDP1 (0.37) TDP1MEN1KMT2AMAPTSMN1; SMN2
SCHEMBL19442922 0.87 TDP1 (0.36) TDP1MEN1KMT2AMAPTSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110392864-B Negative photosensitive resin composition, cured film, element and organic EL display having cured film, and method for producing same 东丽株式会社 2023-05-23 CN disclosed
US-11561470-B2 Negative photosensitive resin composition, cured film, element provided with cured film, organic EL display provided with cured film, and method for producing same TORAY INDUSTRIES, INC. (JP) 2023-01-24 US disclosed
US-20200319549-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELEMENT HAVING CURED FILM, ORGANIC EL DISPLAY, AND METHOD FOR MANUFACTURING ORGANIC EL DISPLAY TORAY INDUSTRIES, INC. (JP) 2020-10-08 US disclosed
CN-111164512-A Photosensitive resin composition, cured film, element provided with cured film, organic EL display, and method for manufacturing organic EL display 东丽株式会社 2020-05-15 CN disclosed
US-20200110337-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELEMENT PROVIDED WITH CURED FILM, ORGANIC EL DISPLAY PROVIDED WITH CURED FILM, AND METHOD FOR PRODUCING SAME TORAY INDUSTRIES, INC. (JP) 2020-04-09 US disclosed