SCHEMBL21829152

SCHEMBL21829152

c1ccc2c(c1)CCC2(c1ccc(OCCOCC2CO2)cc1)c1ccc(OCCOCC2CO2)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.40
MEN1 O00255 6/20 0.36
KMT2A Q03164 3/20 0.36
HPGD P15428 4/20 0.36
LMNA P02545 3/20 0.36
HTT P42858 1/20 0.36
ALDH1A1 P00352 4/20 0.34
TSHR P16473 4/20 0.34
TP53 P04637 3/20 0.34
MAPT P10636 3/20 0.34
HIF1A Q16665 2/20 0.34
SMN1; SMN2 Q16637 2/20 0.34
CYP3A4 P08684 2/20 0.34
CYP1A2 P05177 2/20 0.34
PPARG P37231 1/20 0.34
GAA P10253 1/20 0.34
PKM P14618 1/20 0.34
GLA P06280 1/20 0.33
CYP2D6 P10635 1/20 0.32
CYP2C9 P11712 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22493954 0.94 TDP1 (0.40) TDP1MEN1KMT2AHPGDALDH1A1
SCHEMBL29611304 0.89 TDP1 (0.53) TDP1MEN1KMT2AHPGDLMNA
SCHEMBL15750168 0.89 TDP1 (0.53) TDP1MEN1KMT2AHPGDLMNA
SCHEMBL22493968 0.85 ALDH1A1 (0.33) TDP1HTTALDH1A1TSHRTP53
SCHEMBL21829164 0.84 ALDH1A1 (0.40) TDP1MEN1KMT2ALMNAHTT
SCHEMBL22493949 0.84 TDP1 (0.36) TDP1MEN1KMT2AHPGDHTT
SCHEMBL22493944 0.83 ALDH1A1 (0.36) TDP1MEN1KMT2AHTTALDH1A1
SCHEMBL15750172 0.83 TDP1 (0.51) TDP1MEN1KMT2AHPGDLMNA
SCHEMBL22493958 0.81 MEN1 (0.37) TDP1MEN1KMT2ALMNAALDH1A1
SCHEMBL12009499 0.81 TDP1 (0.44) TDP1MEN1KMT2AHPGDLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110392864-B Negative photosensitive resin composition, cured film, element and organic EL display having cured film, and method for producing same 东丽株式会社 2023-05-23 CN disclosed
US-11561470-B2 Negative photosensitive resin composition, cured film, element provided with cured film, organic EL display provided with cured film, and method for producing same TORAY INDUSTRIES, INC. (JP) 2023-01-24 US disclosed
CN-114830826-A Photosensitive resin composition, cured film, organic EL display, display device, and method for producing cured film 东丽株式会社 2022-07-29 CN disclosed
CN-114127638-A Negative photosensitive resin composition, cured film, organic EL display, and method for producing cured film 东丽株式会社 2022-03-01 CN disclosed
US-20200319549-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELEMENT HAVING CURED FILM, ORGANIC EL DISPLAY, AND METHOD FOR MANUFACTURING ORGANIC EL DISPLAY TORAY INDUSTRIES, INC. (JP) 2020-10-08 US disclosed
CN-111164512-A Photosensitive resin composition, cured film, element provided with cured film, organic EL display, and method for manufacturing organic EL display 东丽株式会社 2020-05-15 CN disclosed
US-20200110337-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELEMENT PROVIDED WITH CURED FILM, ORGANIC EL DISPLAY PROVIDED WITH CURED FILM, AND METHOD FOR PRODUCING SAME TORAY INDUSTRIES, INC. (JP) 2020-04-09 US disclosed