SCHEMBL21829170

SCHEMBL21829170

c1ccc2c(c1)CC(c1ccc(OCCOCC3CO3)c(OCCOCC3CO3)c1)(c1ccc(OCCOCC3CO3)c(OCCOCC3CO3)c1)C2

nearest known ligand 0.37

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.37
GLA P06280 1/20 0.37
TDP1 Q9NUW8 2/20 0.36
TSHR P16473 2/20 0.35
SMN1; SMN2 Q16637 2/20 0.35
TP53 P04637 1/20 0.35
CYP3A4 P08684 1/20 0.35
HIF1A Q16665 1/20 0.35
HTR1A P08908 2/20 0.32
ADRA1D P25100 1/20 0.32
ADRA1A P35348 1/20 0.32
ADRA1B P35368 1/20 0.32
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29831610 1.00 ALDH1A1 (0.37) ALDH1A1GLATDP1TSHRSMN1; SMN2
SCHEMBL22493971 0.91 ALDH1A1 (0.44) ALDH1A1GLATDP1TSHRSMN1; SMN2
SCHEMBL22493956 0.88 MEN1 (0.38) ALDH1A1GLATDP1SMN1; SMN2TP53
SCHEMBL20492279 0.84 TDP1 (0.45) ALDH1A1GLATDP1TSHRSMN1; SMN2
SCHEMBL22493968 0.81 ALDH1A1 (0.33) ALDH1A1GLATDP1TSHRSMN1; SMN2
SCHEMBL22493982 0.80 ALDH1A1 (0.36) ALDH1A1GLATDP1TSHRSMN1; SMN2
SCHEMBL21829163 0.80 ESR1 (0.37) ALDH1A1GLATDP1TSHRSMN1; SMN2
SCHEMBL29831627 0.80 ESR1 (0.37) ALDH1A1GLATDP1TSHRSMN1; SMN2
SCHEMBL20492175 0.78 TDP1 (0.44) ALDH1A1GLATDP1TSHRSMN1; SMN2
SCHEMBL22493973 0.75 TDP1 (0.37) ALDH1A1GLATDP1TSHRSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110392864-B Negative photosensitive resin composition, cured film, element and organic EL display having cured film, and method for producing same 东丽株式会社 2023-05-23 CN disclosed
US-11561470-B2 Negative photosensitive resin composition, cured film, element provided with cured film, organic EL display provided with cured film, and method for producing same TORAY INDUSTRIES, INC. (JP) 2023-01-24 US disclosed
CN-114830826-A Photosensitive resin composition, cured film, organic EL display, display device, and method for producing cured film 东丽株式会社 2022-07-29 CN disclosed
CN-114127638-A Negative photosensitive resin composition, cured film, organic EL display, and method for producing cured film 东丽株式会社 2022-03-01 CN disclosed
US-20200319549-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELEMENT HAVING CURED FILM, ORGANIC EL DISPLAY, AND METHOD FOR MANUFACTURING ORGANIC EL DISPLAY TORAY INDUSTRIES, INC. (JP) 2020-10-08 US disclosed
CN-111164512-A Photosensitive resin composition, cured film, element provided with cured film, organic EL display, and method for manufacturing organic EL display 东丽株式会社 2020-05-15 CN disclosed
US-20200110337-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELEMENT PROVIDED WITH CURED FILM, ORGANIC EL DISPLAY PROVIDED WITH CURED FILM, AND METHOD FOR PRODUCING SAME TORAY INDUSTRIES, INC. (JP) 2020-04-09 US disclosed