SCHEMBL21839147

SCHEMBL21839147

CC(C)CCS(=O)(=O)C(N)(N)S(=O)(=O)CCC(C)C

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CNR2 P34972 1/20 0.33
GAA P10253 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12824344 0.77 CNR2 (0.36) CNR2GAA
SCHEMBL6890613 0.75 CNR2 (0.33) CNR2GAA
SCHEMBL10171155 0.73 CNR2 (0.35) CNR2
SCHEMBL12155293 0.73 CNR2 (0.35) CNR2
SCHEMBL14647246 0.72 CNR2 (0.43) CNR2
SCHEMBL224712 0.70
SCHEMBL14194308 0.70
SCHEMBL3167161 0.69 GAA (0.34) GAA
SCHEMBL1691057 0.69 CNR2 (0.44) CNR2
SCHEMBL329793 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11187982-B2 Photosensitive resin composition, photosensitive dry film, and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-11-30 US disclosed
US-20200117089-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-04-16 US disclosed