SCHEMBL218508

SCHEMBL218508

Cc1cccc(-c2cccc(C)c2C)c1C

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TRPA1 O75762 2/20 0.52
ATM Q13315 1/20 0.52
CYP2A6 P11509 2/20 0.47
CYP1A2 P05177 1/20 0.47
TSHR P16473 2/20 0.47
ACHE P22303 1/20 0.47
ALDH1A1 P00352 2/20 0.45
CA1 P00915 1/20 0.45
CA2 P00918 1/20 0.45
CA7 P43166 1/20 0.45
CA9 Q16790 1/20 0.45
SMN1; SMN2 Q16637 2/20 0.42
NUDT1 P36639 3/20 0.41
P2RX7 Q99572 1/20 0.40
DAO P14920 1/20 0.39
KEAP1 Q14145 1/20 0.39
NFE2L2 Q16236 1/20 0.39
POLB P06746 1/20 0.39
CD44 P16070 1/20 0.39
CNR1 P21554 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30834716 1.00 TRPA1 (0.52) TRPA1ATMCYP2A6CYP1A2TSHR
Ammonia Solution, Strong SCHEMBL22444763 0.97 TRPA1 (0.50) TRPA1ATMCYP2A6CYP1A2TSHR
Ammonia Solution, Strong SCHEMBL15862222 0.97 TRPA1 (0.50) TRPA1ATMCYP2A6CYP1A2TSHR
Hydrogen Sulfide SCHEMBL1538405 0.97 TRPA1 (0.50) TRPA1ATMCYP2A6CYP1A2TSHR
SCHEMBL19838629 0.94 TRPA1 (0.48) TRPA1ATMCYP2A6CYP1A2TSHR
SCHEMBL284410 0.91 TSHR (0.47) TRPA1ATMCYP2A6CYP1A2TSHR
SCHEMBL9701669 0.89 TSHR (0.45) TRPA1ATMCYP2A6CYP1A2TSHR
SCHEMBL3692592 0.85 TRPA1 (0.46) TRPA1ATMCYP2A6CYP1A2TSHR
SCHEMBL11741027 0.85 MYC (0.48) TRPA1ATMCYP2A6CYP1A2TSHR
SCHEMBL23198745 0.84 TRPA1 (0.41) TRPA1ATMCYP2A6CYP1A2TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1064 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260001259-A1 TECHNOLOGY FOR PREPARING HIGH-TEMPERATURE-RESISTANT EPOXY ENERGY STORAGE FILM BASED ON LIQUID CRYSTALLINE ORDERED STRUCTURE XI’AN UNIVERSITY OF ARCHITECTURE AND TECHNOLOGY (CN) 2026-01-01 US claimed
CN-120158091-A Resin composition, metal foil-clad laminate and printed circuit board 广东生益科技股份有限公司 2025-06-17 CN claimed
CN-119905691-A Chemical prelithiation reagent for sulfide solid-state battery, and preparation method and application thereof 北京恩力动力技术有限公司 2025-04-29 CN claimed
CN-119775721-A Halogen-free epoxy resin composition, prepreg comprising same, metal foil-clad laminate and printed circuit board 江西生益科技有限公司 2025-04-08 CN claimed
CN-119752117-A Halogen-free flame-retardant resin composition, prepreg containing same, metal foil-clad laminate and printed circuit board 江西生益科技有限公司 2025-04-04 CN claimed
CN-119708405-A Preparation method and application of environment-friendly acidic color fixing agent 广东炬盛新材料科技有限公司 2025-03-28 CN claimed
CN-118943306-A Zinc metastanniate negative electrode material and preparation method and application thereof 中国地质大学(武汉) 2024-11-12 CN claimed
CN-118725506-A Halogen-free resin composition and application thereof 广东生益科技股份有限公司 2024-10-01 CN claimed
CN-114634708-B Resin composition, prepreg and copper-clad laminate using resin composition 广东生益科技股份有限公司 2024-03-29 CN claimed
CN-117059804-B Chemical pre-lithium agent, lithium ion battery and preparation method of lithium ion battery 瑞浦兰钧能源股份有限公司 2024-03-19 CN claimed
EP-1595905-B1 PROCESS FOR PRODUCING HIGH-PURITY EPOXY RESIN AND EPOXY RESIN COMPOSITION NIPPON STEEL CHEMICAL CO (JP) 2011-08-31 EP claimed
US-6548620-B2 Obtained by reacting 4,4'-dihydroxy-3,3',5,5'-tetramethylbiphenyl and an epihalohydrin in the presence of alkali metal compound; useful in electrical and electronic fields JAPAN EPOXY RESINS CO., LTD. (JP) 2003-04-15 US claimed
US-20020077422-A1 Obtained by reacting 4,4'-dihydroxy-3,3',5,5'-tetramethylbiphenyl and an epihalohydrin in the presence of alkali metal compound; useful in electrical and electronic fields JAPAN EPOXY RESINS CO., LTD. (JP) 2002-06-20 US claimed
CN-1037092-C Process for synthesis of (methylbeneyl) xylene oligomers and their application as dielectric ATOCHEM (FR) 1998-01-21 CN claimed
CN-1031990-C Dielectric composition based on benzyltoluene and (methylbenzyl) xylene ATOCHEM (FR) 1996-06-12 CN claimed
EP-0688805-A1 Phenol aralkyl resins, preparation process thereof and epoxy resin compositions MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1995-12-27 EP claimed
CN-1028516-C Composition based of methylating and benzylating derivatives of diphenylmethane and application as dielectric ATOCHEM (FR) 1995-05-24 CN claimed
CN-1064672-A The synthetic method of xylyl xylene oligomers and as dielectric application ATOCHEM (FR) 1992-09-23 CN claimed
CN-1054416-A With benzyl toluene and (xylyl) dimethylbenzene is the dielectric combination of main component ATOCHEM (FR) 1991-09-11 CN claimed
CN-1054415-A With ditan methylate and the benzyl derivative is the composition of main component and as dielectric application ATOCHEM (FR) 1991-09-11 CN claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260001259-A1 TECHNOLOGY FOR PREPARING HIGH-TEMPERATURE-RESISTANT EPOXY ENERGY STORAGE FILM BASED ON LIQUID CRYSTALLINE ORDERED STRUCTURE SEM1, HSF1, MNAT1 TRPA1 2423/4885ATM 1926/4885CYP2A6 3935/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.