Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TRPM4 | Q8TD43 | 1/20 | 0.56 |
| ▸ | NQO2 | P16083 | 1/20 | 0.48 |
| ▸ | CYP1A2 | P05177 | 3/20 | 0.43 |
| ▸ | ALOX5 | P09917 | 2/20 | 0.41 |
| ▸ | PTPN22 | Q9Y2R2 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.39 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.39 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.39 |
| ▸ | IDO1 | P14902 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 4/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.38 |
| ▸ | HPGD | P15428 | 3/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.38 |
| ▸ | MAPT | P10636 | 2/20 | 0.38 |
| ▸ | TYR | P14679 | 1/20 | 0.38 |
| ▸ | DAO | P14920 | 1/20 | 0.38 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.38 |
| ▸ | MPI | P34949 | 1/20 | 0.38 |
| ▸ | POLB | P06746 | 2/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7823956 | 0.82 | TRPM4 (0.43) | TRPM4NQO2CYP1A2ALOX5ALDH1A1 | |
| SCHEMBL21130706 | 0.75 | KDM4E (0.41) | ALOX5ALDH1A1HSD17B10CYP1B1MEN1 | |
| SCHEMBL23861398 | 0.75 | TRPM4 (0.43) | TRPM4NQO2CYP1A2ALOX5ALDH1A1 | |
| SCHEMBL23861621 | 0.74 | TRPM4 (0.42) | TRPM4NQO2CYP1A2ALOX5PTPN22 | |
| SCHEMBL1332684 | 0.73 | CYP1A2 (0.43) | TRPM4NQO2CYP1A2ALOX5ALDH1A1 | |
| SCHEMBL23861557 | 0.73 | TRPM4 (0.41) | TRPM4NQO2CYP1A2ALOX5ALDH1A1 | |
| SCHEMBL23900972 | 0.73 | KDM4E (0.46) | TRPM4NQO2CYP1A2ALDH1A1HIF1A | |
| SCHEMBL508755 | 0.72 | TRPM4 (1.00) | TRPM4NQO2CYP1A2ALOX5PTPN22 | |
| SCHEMBL29399180 | 0.72 | TRPM4 (1.00) | TRPM4NQO2CYP1A2ALOX5PTPN22 | |
| SCHEMBL23900989 | 0.71 | TRPM4 (0.40) | TRPM4NQO2CYP1A2ALDH1A1MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112626508-B | Surface treatment liquid for copper or copper alloy plate and preparation method and application thereof | 广州三孚新材料科技股份有限公司 | 2022-11-11 | — | — | CN | claimed |
| CN-121586750-A | Composition for forming silicon-containing underlayer film for directional self-assembly | 日产化学株式会社 | 2026-02-27 | — | — | CN | disclosed |
| WO-2025041813-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING UNDERLAYER FILM FOR INDUCED SELF-ASSEMBLY | 日産化学株式会社 | 2025-02-27 | — | — | WO | disclosed |
| US-20240302744-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING UNDERLAYER FILM FOR INDUCED SELF-ORGANIZATION | NISSAN CHEMICAL CORPORATION (JP) | 2024-09-12 | — | — | US | disclosed |
| CN-118241265-A | Tin plating additive composition and plating solution | 深圳市睿烯新材料科技有限公司 | 2024-06-25 | — | — | CN | disclosed |
| CN-117063129-A | Composition for forming silicon-containing underlayer film for directional self-assembly | 日产化学株式会社 | 2023-11-14 | — | — | CN | disclosed |
| US-11674053-B2 | Composition for forming underlayer film of self-assembled film including aliphatic polycyclic structure | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-06-13 | — | — | US | disclosed |
| CN-112626508-B | Surface treatment liquid for copper or copper alloy plate and preparation method and application thereof | 广州三孚新材料科技股份有限公司 | 2022-11-11 | — | — | CN | disclosed |
| WO-2022210960-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING UNDERLAYER FILM FOR INDUCED SELF-ORGANIZATION | 日産化学株式会社 | 2022-10-06 | — | — | WO | disclosed |
| EP-2343597-B1 | Use of an underlayer coating forming composition for lithography | NISSAN CHEMICAL IND LTD (JP) | 2015-08-05 | — | — | EP | disclosed |
| CN-100351309-C | Underlayer coating forming composition for lithography containing compound having protected carboxyl group | NISSAN CHEMICAL IND LTD (JP) | 2007-11-28 | — | — | CN | disclosed |
| EP-1850180-A1 | COMPOSITION FOR FORMING OF UNDERLAYER FILM FOR LITHOGRAPHY THAT CONTAINS COMPOUND HAVING PROTECTED CARBOXYL | Nissan Chemical Industries, Ltd. (JP) | 2007-10-31 | — | — | EP | disclosed |
| US-7226721-B2 | Underlayer coating forming composition for lithography containing compound having protected carboxyl group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-06-05 | — | — | US | disclosed |
| US-20060234156-A1 | Composition for formation of underlayer film for lithography containing epoxy compound and carboxylic acid compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-10-19 | — | — | US | disclosed |
| US-20060210915-A1 | Composition for forming lower layer film for lithography comprising compound having protected carboxyl group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-09-21 | — | — | US | disclosed |
| CN-1830202-A | Composition for forming lower layer film for lithography comprising compound having protected carboxyl group | NISSAN CHEMICAL IND LTD (JP) | 2006-09-06 | — | — | CN | disclosed |
| EP-1662769-A1 | COMPOSITION FOR FORMING LOWER LAYER FILM FOR LITHOGRAPHY COMPRISING COMPOUND HAVING PROTECTED CARBOXYL GROUP | Nissan Chemical Industries, Ltd. (JP) | 2006-05-31 | — | — | EP | disclosed |
| EP-1617289-A1 | COMPOSITION FOR FORMATION OF UNDERLAYER FILM FOR LITHOGRAPHY CONTAINING EPOXY COMPOUND AND CARBOXYLIC ACID COMPOUND | Nissan Chemical Industries, Ltd. (JP) | 2006-01-18 | — | — | EP | disclosed |
| EP-0522176-A1 | DIHYDROPYRIDINE COMPOUNDS, AND PROCESS FOR THEIR PREPARATION | FUJISAWA PHARMACEUTICAL CO., LTD. (JP) | 1993-01-13 | — | — | EP | disclosed |
| WO-1992013839-A1 | DIHYDROPYRIDINE COMPOUNDS, AND PROCESS FOR THEIR PREPARATION | FUJISAWA PHARMACEUTICAL CO., LTD. (JP) | 1992-08-20 | — | — | WO | disclosed |