⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL35627 | 0.64 | — | — | |
| SCHEMBL21882095 | 0.62 | — | — | |
| SCHEMBL24397764 | 0.62 | — | — | |
| Hydrochloric Acid SCHEMBL2961798 | 0.60 | — | — | |
| SCHEMBL152040 | 0.60 | — | — | |
| SCHEMBL27992237 | 0.60 | TSHR (0.39) | — | |
| SCHEMBL2270442 | 0.57 | — | — | |
| Water SCHEMBL7045913 | 0.57 | TSHR (0.36) | — | |
| Ammonia Solution, Strong SCHEMBL11331271 | 0.57 | — | — | |
| Hydrochloric Acid SCHEMBL3468882 | 0.57 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11749522-B2 | Composition for depositing silicon-containing thin film containing bis(aminosilyl)alkylamine compound and method for manufacturing silicon-containing thin using the same | DNF CO., LTD. (KR) | 2023-09-05 | — | — | US | disclosed |
| US-11749522-B2 | Composition for depositing silicon-containing thin film containing bis(aminosilyl)alkylamine compound and method for manufacturing silicon-containing thin using the same | DNF CO., LTD. (KR) | 2023-09-05 | — | — | US | disclosed |
| US-20220139704-A1 | COMPOSITION FOR DEPOSITING SILICON-CONTAINING THIN FILM CONTAINING BIS(AMINOSILYL)ALKYLAMINE COMPOUND AND METHOD FOR MANUFACTURING SILICON CONTAINING THIN FILM USING THE SAME | DNF CO., LTD. (KR) | 2022-05-05 | — | — | US | disclosed |
| US-20200111664-A1 | COMPOSITION FOR DEPOSITING SILICON-CONTAINING THIN FILM CONTAINING BIS(AMINOSILYL)ALKYLAMINE COMPOUND AND METHOD FOR MANUFACTURING SILICON-CONTAINING THIN FILM USING THE SAME | DNF CO., LTD. (KR) | 2020-04-09 | — | — | US | disclosed |