SCHEMBL2190934

SCHEMBL2190934

CC(C)O[SiH](C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11761307 0.96
Hydrochloric Acid SCHEMBL28429403 0.89
SCHEMBL28781243 0.84
SCHEMBL308429 0.75
SCHEMBL30409038 0.75
SCHEMBL106461 0.70
SCHEMBL23701241 0.69
SCHEMBL17718003 0.69
SCHEMBL8679741 0.69
SCHEMBL17033945 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 192 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115516129-A Novel precursors for depositing films with high elastic modulus 弗萨姆材料美国有限责任公司 2022-12-23 CN claimed
CN-111072743-B Synthetic method of loteprednol etabonate intermediate 天津药业研究院股份有限公司 2022-06-14 CN claimed
US-10991571-B2 High temperature atomic layer deposition of silicon oxide thin films VERSUM MATERIALS US, LLC (US) 2021-04-27 US claimed
US-20190189431-A1 High Temperature Atomic Layer Deposition of Silicon Oxide Thin Films VERSUM MATERIALS US, LLC (US) 2019-06-20 US claimed
US-20170256399-A9 High Temperature Atomic Layer Deposition Of Silicon Oxide Thin Films AIR PRODUCTS AND CHEMICALS, INC. (US) 2017-09-07 US claimed
CN-103374708-B High temperature atomic layer deposition of silicon oxide thin films 气体产品与化学公司 2017-05-17 CN claimed
US-20160365244-A1 High Temperature Atomic Layer Deposition Of Silicon Oxide Thin Films AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-12-15 US claimed
US-20130295779-A1 HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON OXIDE THIN FILMS VERSUM MATERIALS US, LLC 2013-11-07 US claimed
CN-103374708-A High temperature atomic layer deposition of silicon oxide thin films AIR PROD & CHEM 2013-10-30 CN claimed
EP-2650399-A2 High temperature atomic layer deposition of silicon oxide thin films AIR PRODUCTS AND CHEMICALS, INC. (US) 2013-10-16 EP claimed
US-8217129-B2 Polyalkylene oxide asymmetric siloxane MOMENTIVE PERFORMANCE MATERIALS (US) 2012-07-10 US claimed
WO-2012052439-A1 PROCESS FOR PREPARING A SILICONE RESIN AND COSMETIC USE OF THE RESIN L'OREAL (FR) 2012-04-26 WO claimed
US-20110172453-A1 ASYMMETRIC SILOXANE MOMENTIVE PERFORMANCE MATERIALS INC. 2011-07-14 US claimed
US-20070282121-A1 INTERMEDIATES FOR THE SYNTHESIS OF POLYPROPIONATE ANTIBIOTICS NATIONAL INSTITUTES OF HEALTH (NIH), U.S. DEPT. OF HEALTH AND HUMAN SERVICES (DHHS), U.S. GOVERNMENT 2007-12-06 US claimed
US-7297807-B1 Intermediates for the synthesis of polypropionate antibiotics THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) 2007-11-20 US claimed
US-20260107711-A1 PRECURSORS FOR DEPOSITING FILMS WITH ELASTIC MODULUS VERSUM MAT US LLC (US) 2026-04-16 US disclosed
US-12563982-B2 Additives to enhance the properties of dielectric films VERSUM MATERIALS US, LLC (US) 2026-02-24 US disclosed
US-4265801-A FIREPROOF DIELECTRIC SACKETS FOR WIRES ETC. RAYCHEM LIMITED (GB) 1981-05-05 US disclosed
US-4052283-A FROM ALLENE AND HYDROGEN SULFIDE, POLYMERIZATION HOOKER CHEMICALS & PLASTICS CORPORATION (US) 1977-10-04 US disclosed
US-3992274-A ALLENE COMPOUNDS, HYDROGEN SULFIDE, PHOTOSENSITIZING AGENT HOOKER CHEMICALS & PLASTICS CORPORATION (US) 1976-11-16 US disclosed