⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27710205 | 0.82 | — | — | |
| SCHEMBL2190934 | 0.75 | — | — | |
| SCHEMBL26676541 | 0.75 | — | — | |
| SCHEMBL7057625 | 0.73 | — | — | |
| SCHEMBL11761307 | 0.72 | — | — | |
| SCHEMBL2363424 | 0.71 | TSHR (0.42) | — | |
| SCHEMBL106461 | 0.70 | — | — | |
| SCHEMBL17718003 | 0.69 | — | — | |
| SCHEMBL6897694 | 0.69 | ALDH1A1 (0.33) | — | |
| SCHEMBL13089340 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 525 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024109453-A1 | PURIFICATION METHOD FOR ALKOXY SILANE COMPOSITION | 江苏南大光电材料股份有限公司 | 2024-05-30 | — | — | WO | claimed |
| US-20240052490-A1 | MONOALKOXYSILANES AND DIALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM | VERSUM MATERIALS US, LLC (US) | 2024-02-15 | — | — | US | claimed |
| CN-115490719-A | Purification method of alkoxy silane composition | 江苏南大光电材料股份有限公司 | 2022-12-20 | — | — | CN | claimed |
| EP-4018015-A1 | MONOALKOXYSILANES AND DIALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM | Versum Materials US, LLC (US) | 2022-06-29 | — | — | EP | claimed |
| CN-114556527-A | Monoalkoxysilanes and dialkoxysilanes and dense organosilica films prepared therefrom | 弗萨姆材料美国有限责任公司 | 2022-05-27 | — | — | CN | claimed |
| CN-110982282-B | Fluorosilicone rubber composition and preparation method thereof | 江门市胜鹏化工实业有限公司 | 2022-01-04 | — | — | CN | claimed |
| WO-2021050798-A1 | MONOALKOXYSILANES AND DIALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM | VERSUM MATERIALS US, LLC (US) | 2021-03-18 | — | — | WO | claimed |
| CN-110982282-A | Fluorosilicone rubber composition and preparation method thereof | 陈志强 | 2020-04-10 | — | — | CN | claimed |
| EP-2876099-B1 | Norbornadiene purification method | AIR LIQUIDE (FR) | 2017-11-15 | — | — | EP | claimed |
| US-9061317-B2 | Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2015-06-23 | — | — | US | claimed |
| US-20060027249-A1 | Method for removing carbon-containing residues from a substrate | AIR PRODUCTS AND CHEMICALS, INC. | 2006-02-09 | — | — | US | claimed |
| EP-1619267-A2 | Method for removing carbon-containing residues from a substrate | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2006-01-25 | — | — | EP | claimed |
| EP-1561841-A2 | Cleaning CVD Chambers following deposition of porogen-containing materials | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-08-10 | — | — | EP | claimed |
| US-20050161060-A1 | Cleaning CVD chambers following deposition of porogen-containing materials | AIR PRODUCTS AND CHEMICALS, INC. | 2005-07-28 | — | — | US | claimed |
| US-6846515-B2 | Methods for using porogens and/or porogenated precursors to provide porous organosilica glass films with low dielectric constants | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-01-25 | — | — | US | claimed |
| US-20040197474-A1 | Method for enhancing deposition rate of chemical vapor deposition films | VERSUM MATERIALS US, LLC | 2004-10-07 | — | — | US | claimed |
| EP-1464726-A2 | CVD method for forming a porous low dielectric constant SiOCH film | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2004-10-06 | — | — | EP | claimed |
| US-20030232137-A1 | Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants | VERSUM MATERIALS US, LLC | 2003-12-18 | — | — | US | claimed |
| US-20030198742-A1 | Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants | VERSUM MATERIALS US, LLC | 2003-10-23 | — | — | US | claimed |
| EP-1354980-A1 | Method for forming a porous SiOCH layer. | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2003-10-22 | — | — | EP | claimed |