Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | FFAR3 | O14843 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.31 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acetic Acid SCHEMBL986871 | 0.86 | FFAR3 (0.38) | SMN1; SMN2FFAR3TSHRNFKB1CYP2C19 | |
| Acetic Acid SCHEMBL1397456 | 0.84 | FFAR3 (0.36) | FFAR3TSHRNFKB1CYP2C19 | |
| Acetamide SCHEMBL27990982 | 0.79 | LMNA (0.40) | SMN1; SMN2FFAR3 | |
| Acrylic Acid SCHEMBL22408824 | 0.78 | LMNA (0.43) | FFAR3TSHRNFKB1CYP2C19 | |
| Acrylic Acid SCHEMBL27811861 | 0.78 | LMNA (0.43) | FFAR3TSHRNFKB1CYP2C19 | |
| Acrylic Acid SCHEMBL27862305 | 0.78 | LMNA (0.43) | FFAR3TSHRNFKB1CYP2C19 | |
| Carbamic Acid SCHEMBL25306255 | 0.77 | FFAR3 (0.35) | SMN1; SMN2FFAR3TSHRNFKB1CYP2C19 | |
| Carbamic Acid SCHEMBL454900 | 0.77 | FFAR3 (0.35) | SMN1; SMN2FFAR3TSHRNFKB1CYP2C19 | |
| Succinic Acid SCHEMBL2342959 | 0.76 | EGLN1 (0.41) | FFAR3CYP2C19 | |
| Succinic Acid SCHEMBL28499250 | 0.76 | EGLN1 (0.41) | FFAR3CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109400798-B | Environment-friendly super-hydrophobic/oleophobic textile finishing agent, preparation method and application thereof | 江南大学 | 2021-04-27 | — | — | CN | claimed |
| US-20250093777-A1 | RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2025-03-20 | — | — | US | disclosed |
| WO-2024166382-A1 | PRIMARY BATTERY | 日本電信電話株式会社 | 2024-08-15 | — | — | WO | disclosed |
| WO-2024142381-A1 | SECONDARY BATTERY | 日本電信電話株式会社 | 2024-07-04 | — | — | WO | disclosed |
| WO-2024142391-A1 | SECONDARY BATTERY | 日本電信電話株式会社 | 2024-07-04 | — | — | WO | disclosed |
| CN-115863563-A | Secondary battery for relay storage of anions and cations and preparation method and application thereof | 中国科学院深圳先进技术研究院 | 2023-03-28 | — | — | CN | disclosed |
| CN-114207525-A | Photosensitive transfer member, method for manufacturing resin pattern, method for manufacturing circuit wiring, and method for manufacturing touch panel | 富士胶片株式会社 | 2022-03-18 | — | — | CN | disclosed |
| CN-109803826-B | Laminate and method for producing same | 信越化学工业株式会社 | 2021-05-11 | — | — | CN | disclosed |
| CN-109400798-B | Environment-friendly super-hydrophobic/oleophobic textile finishing agent, preparation method and application thereof | 江南大学 | 2021-04-27 | — | — | CN | disclosed |
| CN-112204468-A | Photosensitive transfer material, method for producing resin pattern, method for producing circuit wiring, and method for producing touch panel | 富士胶片株式会社 | 2021-01-08 | — | — | CN | disclosed |
| EP-2025689-A1 | PROCESS FOR PRODUCTION OF POLYRADICAL COMPOUND AND BATTERY CELL | NEC Corporation (JP) | 2009-02-18 | — | — | EP | disclosed |
| US-20080038636-A1 | Method for Manufacturing Polyradical Compound and Battery | NEC CORPORATION (JP) | 2008-02-14 | — | — | US | disclosed |
| CN-101069307-A | Process for producing polyradical compound and battery | NIPPON ELECTRIC CO (JP) | 2007-11-07 | — | — | CN | disclosed |
| CN-1302431-C | Retroreflective product in which integrated circuit is sealed | NIPPON CARBIDE KOGYO KK (JP) | 2007-02-28 | — | — | CN | disclosed |
| CN-1231987-C | Charge storage device | NEC CORP (JP) | 2005-12-14 | — | — | CN | disclosed |
| CN-1193241-C | Fluorescent retroreflective sheet | NIPPON CARBIDE KOGYO KK (JP) | 2005-03-16 | — | — | CN | disclosed |
| CN-1529871-A | Retroreflective product in which integrated circuit is sealed | �ձ�������ҵ��ʽ���� | 2004-09-15 | — | — | CN | disclosed |
| CN-1500293-A | Electricity storage device | 日本电气株式会社 | 2004-05-26 | — | — | CN | disclosed |
| US-20030075715-A1 | Thin film transistor | NEC CORPORATION (JP) | 2003-04-24 | — | — | US | disclosed |
| CN-1366619-A | Fluorescent retroreflective sheet | NIPPON CARBIDE KOGYO KK (JP) | 2002-08-28 | — | — | CN | disclosed |