⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19756184 | 0.83 | — | — | |
| SCHEMBL26059728 | 0.81 | ALDH1A1 (0.34) | — | |
| SCHEMBL26059720 | 0.80 | — | — | |
| SCHEMBL19756181 | 0.78 | — | — | |
| SCHEMBL25564560 | 0.76 | PTPN2 (0.35) | — | |
| SCHEMBL23974026 | 0.74 | — | — | |
| SCHEMBL25564555 | 0.74 | — | — | |
| SCHEMBL23963360 | 0.73 | — | — | |
| SCHEMBL18776017 | 0.73 | POLB (0.31) | — | |
| SCHEMBL25564558 | 0.72 | ALDH1A1 (0.37) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230244142-A1 | POLYMER, RESIST COMPOSITION, AND PATTERN FORMING METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-03 | — | — | US | disclosed |
| US-20230244142-A1 | POLYMER, RESIST COMPOSITION, AND PATTERN FORMING METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-03 | — | — | US | disclosed |
| US-10613437-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-04-07 | — | — | US | disclosed |