SCHEMBL219195

SCHEMBL219195

CCCC(N)C(C)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24134387 1.00
SCHEMBL14928430 1.00
SCHEMBL24690026 1.00
SCHEMBL24547712 0.85 METAP1 (0.46)
SCHEMBL19117382 0.85 METAP1 (0.46)
SCHEMBL20663195 0.83 OPRM1 (0.46)
SCHEMBL26493584 0.83 METAP1 (0.34)
SCHEMBL27945762 0.82 OPRM1 (0.43)
SCHEMBL516695 0.81 OPRM1 (0.56)
SCHEMBL726434 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5731128-A ELASTICITY, HARDNESS, ELONGATION; WATER DEVELOPABILITY NIPPON PAINT CO., LTD. (JP) 1998-03-24 US claimed
EP-3820846-B1 COMPOSITION FOR INHIBITING MONOMER POLYMERIZATION COMPRISING A NITROXIDE INHIBITOR, A QUINONE METHIDE RETARDER AND AN AMINE STABILIZER ECOLAB USA INC (US) 2024-01-03 EP disclosed
CN-110475748-B Method for producing titanium-containing silicon oxide, method for producing epoxide, and titanium-containing silicon oxide 住友化学株式会社 2022-12-30 CN disclosed
EP-2384457-B1 COATING COMPOSITIONS MERCK PATENT GMBH (DE) 2022-07-06 EP disclosed
US-11180578-B2 Polymerization inhibitor and retarder compositions with amine stabilizer ECOLAB USA INC. (US) 2021-11-23 US disclosed
WO-2021215545-A1 ANTICANCER COMBINATION THERAPY WITH N-(1-ACRYLOYL-AZETIDIN-3-YL)-2-((1H-INDAZOL-3-YL)AMINO)METHYL)-1H-IMIDAZOLE-5-CARBOXAMIDE INHIBITOR OF KRAS-G12C TAIHO PHARMACEUTICAL CO., LTD. (JP) 2021-10-28 WO disclosed
US-11056551-B2 Display device Samsung Display Co., . Ltd. 2021-07-06 US disclosed
EP-3820846-A1 COMPOSITION FOR INHIBITING MONOMER POLYMERIZATION COMPRISING A NITROXIDE INHIBITOR, A QUINONE METHIDE RETARDER AND AN AMINE STABILIZER Ecolab USA, Inc. (US) 2021-05-19 EP disclosed
CN-112533902-A Compositions comprising nitroxide inhibitors, quinone methide blockers and amine stabilizers to inhibit polymerization of monomers 埃科莱布美国股份有限公司 2021-03-19 CN disclosed
US-10463815-B2 Inhaler to deliver substances for prophylaxis or prevention of disease or injury caused by the inhalation of biological or chemical agents Respira Therapeutics, Inc. (US) 2019-11-05 US disclosed
EP-0745900-A1 Water-developing photosensitive resin composition Nippon Paint Co., Ltd. (JP) 1996-12-04 EP disclosed
EP-0607962-B1 Photosensitive resin composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 1996-07-17 EP disclosed
EP-0675412-A1 Photosensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1995-10-04 EP disclosed
US-5344555-A Sweetening oils and desulfurization BAKER HUGHES INCORPORATED (US) 1994-09-06 US disclosed
EP-0607962-A1 Photosensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1994-07-27 EP disclosed
EP-0538819-A2 Treatment of oils using epoxylated tertiary amines BAKER HUGHES INCORPORATED (US) 1993-04-28 EP disclosed
EP-0206621-B1 PROCESS FOR DISPROPORTIONATING SILANES MITSUI TOATSU CHEMICALS, Inc. (JP) 1989-11-15 EP disclosed
EP-0206621-A1 Process for disproportionating silanes MITSUI TOATSU CHEMICALS, Inc. (JP) 1986-12-30 EP disclosed
US-4156675-A ANTISTATIC PROPERTIES, ELECTROLYTES, SURFACTANTS NHK SPRING CO., LTD. (JP) 1979-05-29 US disclosed
US-4136079-A UREA COMPOUND HAVING CARBOXYLATE RADICAL AND METHOD FOR PRODUCING THE SAME NHK SPRING CO., LTD. (JP) 1979-01-23 US disclosed